ZnO growth on Si substrates by metalorganic vapor phase epitaxy

K. Ogata, S. W. Kim, Sz Fujita, Sg Fujita

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34 Citations (Scopus)

Abstract

Diethylzinc (DEZn) and nitrous oxide (N2O) as a source gas combination in the metalorganic vapor phase epitaxy (MOVPE) of zinc oxide (ZnO) has produced high-quality layers on sapphire, but no growth was confirmed on Si. This problem was overcome by using an underlying layer of ZnO grown directly onto the Si using nitrogen oxide (NO2) as a more reactive oxidation source. The main ZnO layer grown in this way on the ZnO/Si pretreated at 800°C possessed a c-axis orientation and exhibited bound exciton (BX) emission as narrow as 3 meV at full-width at half-maximum together with a free exciton (EX) at 9 K. These results demonstrated the high potential of MOVPE technology for the growth of ZnO on Si using appropriate surface treatments for optical and electrical applications.

Original languageEnglish
Pages (from-to)112-116
Number of pages5
JournalJournal of Crystal Growth
Volume240
Issue number1-2
DOIs
Publication statusPublished - 2002 Apr

Bibliographical note

Funding Information:
This work was supported by the NEDO Regional Consortium Project and by one of the projects at Kyoto University Venture Business Laboratory.

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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