Wavefront error measurement of high-numerical-aperture optics with a Shack-Hartmann sensor and a point source

We developed a new, to the best of our knowledge, test method to measure the wavefront error of the high-NA optics that is used to read the information on the high-capacity optical data storage devices. The main components are a pinhole point source and a Shack-Hartmann sensor. A pinhole generates the high-NA reference spherical wave, and a Shack-Hartmann sensor constructs the wavefront error of the target optics. Due to simplicity of the setup, it is easy to use several different wavelengths without significant changes of the optical elements in the test setup. To reduce the systematic errors in the system, a simple calibration method was developed. In this manner, we could measure the wavefront error of the NA 0.9 objective with the repeatability of 0.003λ. rms (λ = 632.8 nm) and the accuracy of 0.01λ rms.