Wafer-Scale Synthesis of Highly Oriented 2D Topological Semimetal PtTe2 via Tellurization

Minhyuk Choi, Saeyoung Oh, Sungsoo Hahn, Yubin Ji, Min Kyung Jo, Jeongtae Kim, Tae Seong Ju, Gyeongbo Kim, Minseung Gyeon, Yuhwa Lee, Jeonghyeon Do, Seungwook Choi, Ansoon Kim, Seungmo Yang, Chanyong Hwang, Kab Jin Kim, Doohee Cho, Changyoung Kim, Kibum Kang, Hu Young JeongSeungwoo Song

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Platinum ditelluride (1T-PtTe2) is a two-dimensional (2D) topological semimetal with a distinctive band structure and flexibility of van der Waals integration as a promising candidate for future electronics and spintronics. Although the synthesis of large-scale, uniform, and highly crystalline films of 2D semimetals system is a prerequisite for device application, the synthetic methods meeting these criteria are still lacking. Here, we introduce an approach to synthesize highly oriented 2D topological semimetal PtTe2 using a thermally assisted conversion called tellurization, which is a cost-efficient method compared to the other epitaxial deposition methods. We demonstrate that achieving highly crystalline 1T-PtTe2 using tellurization is not dependent on epitaxy but rather relies on two critical factors: (i) the crystallinity of the predeposited platinum (Pt) film and (ii) the surface coverage ratio of the Pt film considering lateral lattice expansion during transformation. By optimizing the surface coverage ratio of the epitaxial Pt film, we successfully obtained 2 in. wafer-scale uniformity without in-plane misalignment between antiparallelly oriented domains. The electronic band structure of 2D topological PtTe2 is clearly resolved in momentum space, and we observed an interesting 6-fold gapped Dirac cone at the Fermi surface. Furthermore, ultrahigh electrical conductivity down to ∼3.8 nm, which is consistent with that of single crystal PtTe2, was observed, proving its ultralow defect density.

Original languageEnglish
Pages (from-to)15154-15166
Number of pages13
JournalACS Nano
Volume18
Issue number23
DOIs
Publication statusPublished - 2024 Jun 11

Bibliographical note

Publisher Copyright:
© 2024 American Chemical Society.

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • General Engineering
  • General Physics and Astronomy

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