Abstract
A novel vertical interconnection utilizing finite ground coplanar waveguide (FGCPW) and silicon micromachining has been developed for W-band The measured results indicate insertion loss of only 0.6 dB. This transition uses standard processing techniques and is a compact, 520 ¿m width and 520 ¿m length, design. With this vertical interconnect, multiple IC layers may be connected to achieve new levels of high density, low loss integration.
Original language | English |
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Pages | 402-406 |
Number of pages | 5 |
DOIs | |
Publication status | Published - 1999 |
Event | 1999 29th European Microwave Conference, EuMC 1999 - Munich, Germany Duration: 1999 Oct 5 → 1999 Oct 7 |
Other
Other | 1999 29th European Microwave Conference, EuMC 1999 |
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Country/Territory | Germany |
City | Munich |
Period | 99/10/5 → 99/10/7 |
All Science Journal Classification (ASJC) codes
- Computer Networks and Communications
- Hardware and Architecture
- Electrical and Electronic Engineering