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Very high frequency plasma reactant for atomic layer deposition
Il Kwon Oh, Gilsang Yoo, Chang Mo Yoon, Tae Hyung Kim, Geun Young Yeom, Kangsik Kim, Zonghoon Lee, Hanearl Jung, Chang Wan Lee, Hyungjun Kim, Han Bo Ram Lee
Research output: Contribution to journal › Article › peer-review
13
Citations
(Scopus)