TY - JOUR
T1 - Vacancy defects in low-temperature-grown GaAs observed by continuous and pulsed slow positrons
AU - Gebauer, J.
AU - Krause-Rehberg, R.
AU - Eichler, S.
AU - Bauer-Kugelmann, W.
AU - Kögel, G.
AU - Trifthäuser, W.
AU - Luysberg, M.
AU - Sohn, H.
AU - Weber, E. R.
PY - 1997
Y1 - 1997
N2 - A systematic investigation of GaAs grown at low temperatures (LT-GaAs) was carried out. The vacancy defects in the as-grown material were identified to be mainly Ga vacancies by comparing the core-(W) and valence-(S) annihilation parameters to that of Ga vacancies in highly Si-doped GaAs. The vacancy concentration increases up to 1018 cm-3. Isochronal annealing was done at various samples. The S parameter in the samples increases with annealing, suggesting the formation of new defects. By checking the correlation between S and W we estimated that the defects seen in annealed LT-GaAs are physically different from that in the as-grown state. The annealed samples showed nearly saturated trapping with a defect related positron lifetime of 345 ps, which can be attributed to vacancy clusters or the As precipitates found by correlated TEM measurements.
AB - A systematic investigation of GaAs grown at low temperatures (LT-GaAs) was carried out. The vacancy defects in the as-grown material were identified to be mainly Ga vacancies by comparing the core-(W) and valence-(S) annihilation parameters to that of Ga vacancies in highly Si-doped GaAs. The vacancy concentration increases up to 1018 cm-3. Isochronal annealing was done at various samples. The S parameter in the samples increases with annealing, suggesting the formation of new defects. By checking the correlation between S and W we estimated that the defects seen in annealed LT-GaAs are physically different from that in the as-grown state. The annealed samples showed nearly saturated trapping with a defect related positron lifetime of 345 ps, which can be attributed to vacancy clusters or the As precipitates found by correlated TEM measurements.
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U2 - 10.4028/www.scientific.net/msf.255-257.204
DO - 10.4028/www.scientific.net/msf.255-257.204
M3 - Article
AN - SCOPUS:0031364292
SN - 0255-5476
VL - 255-257
SP - 204
EP - 208
JO - Materials Science Forum
JF - Materials Science Forum
ER -