Ultrafast and thermally stable ternary Ge0.33SexSy ovonic threshold switching selector using magnetron sputtering

Minkyu Lee, Sanghyeon Lee, Myoungsub Kim, Jinhan Lee, Chaebeen Kwon, Chihyeong Won, Taehoon Kim, Seungmin Lee, Sungjoon Cho, Seunggyu Na, Seungwon Park, Kukro Yoon, Hyungjun Kim, Taeyoon Lee

Research output: Contribution to journalArticlepeer-review

Abstract

3D cross–point memory, with its cost efficiency and simple structure, has gained attention and commercial success. In this memory architecture, chalcogenide–based ovonic threshold (OTS) selectors are promising due to their fast, volatile, and reliable transition without altering their amorphous structure. GeS–based OTs selectors have recently emerged as potential candidates due to their thermal stability and high Ion. However, Ge1−xSx selectors suffer from slow switching times (ton of 10 – 15 ns and toff of 20 – 100 ns), hindering fast data processing. To address this, synthesizing Ge1−xSex into Ge1−xSx is proposed as an effective method, as it reduces the activation energy (Ea) of Ge0.33SexSy, resulting in shorter ton. This study presents a thermally stable and ultrafast OTS selector based on Ge0.33SexSy (0.22 ≤ x ≤ 0.55) films. There films remain amorphous after annealing at 600 °C. the device with the highest Se composition (x = 0.55) exhibits a short ton of 6 ns and toff of 13 ns. Ge0.33SexSy devices show varying Vth (3.6 to 2.8 V) as the Se/S ratio increases, along with low Ioff (up to 1.2 nA). Further analysis using a modified Pool–Frenekl model reveals crucial parameters, and optical properties changes as the Se/S ratio increases. This ultrafast and thermally stable OTS selector promises outstanding performance for X–point memory architecture.

Original languageEnglish
Article number172863
JournalJournal of Alloys and Compounds
Volume973
DOIs
Publication statusPublished - 2024 Feb 5

Bibliographical note

Publisher Copyright:
© 2023 Elsevier B.V.

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

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