Abstract
A method to measure and tune the spring constant of tips in a cantilever-free array by adjusting the mechanical properties of the elastomeric layer on which it is based is reported. Using this technique, large-area silicon tip arrays are fabricated with spring constants tuned ranging from 7 to 150 N/m. To illustrate the benefit of utilizing a lower spring constant array, the ability to pattern on a delicate 50 nm silicon nitride substrate is explored.
Original language | English |
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Pages (from-to) | 664-667 |
Number of pages | 4 |
Journal | Nano letters |
Volume | 13 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2013 Feb 13 |
All Science Journal Classification (ASJC) codes
- Bioengineering
- Chemistry(all)
- Materials Science(all)
- Condensed Matter Physics
- Mechanical Engineering