Thin-film-based sensitivity enhancement for total internal reflection fluorescence live-cell imaging

Kyujung Kim; Eun Jin Cho; Yong Min Huh; Donghyun Kim

doi:10.1364/OL.32.003062

Thin-film-based sensitivity enhancement for total internal reflection fluorescence live-cell imaging

Kyujung Kim, Eun Jin Cho, Yong Min Huh, Donghyun Kim

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

We investigated experimentally the evanescent field enhancement based on dielectric thin films in total internal reflection microscopy. The sample employed two layers of Al₂O₃ and SiO₂ deposited on an SF10 glass substrate. Field intensity enhancement measured by fluorescent excitation of microbeads relative to that of a control sample without dielectric films was polarization dependent, determined as 4.2 and 2.4 for TE and TM polarizations, respectively, and was in good agreement with numerical results. The thin-film-based field enhancement was also applied to live-cell imaging of quantum dots, which confirmed the sensitivity enhancement qualitatively.

Original language	English
Pages (from-to)	3062-3064
Number of pages	3
Journal	Optics Letters
Volume	32
Issue number	21
DOIs	https://doi.org/10.1364/OL.32.003062
Publication status	Published - 2007 Nov 1

All Science Journal Classification (ASJC) codes

Atomic and Molecular Physics, and Optics

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10.1364/OL.32.003062

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abstract = "We investigated experimentally the evanescent field enhancement based on dielectric thin films in total internal reflection microscopy. The sample employed two layers of Al2O3 and SiO2 deposited on an SF10 glass substrate. Field intensity enhancement measured by fluorescent excitation of microbeads relative to that of a control sample without dielectric films was polarization dependent, determined as 4.2 and 2.4 for TE and TM polarizations, respectively, and was in good agreement with numerical results. The thin-film-based field enhancement was also applied to live-cell imaging of quantum dots, which confirmed the sensitivity enhancement qualitatively.",

author = "Kyujung Kim and Cho, {Eun Jin} and Huh, {Yong Min} and Donghyun Kim",

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AU - Kim, Kyujung

AU - Cho, Eun Jin

AU - Huh, Yong Min

AU - Kim, Donghyun

PY - 2007/11/1

Y1 - 2007/11/1

N2 - We investigated experimentally the evanescent field enhancement based on dielectric thin films in total internal reflection microscopy. The sample employed two layers of Al2O3 and SiO2 deposited on an SF10 glass substrate. Field intensity enhancement measured by fluorescent excitation of microbeads relative to that of a control sample without dielectric films was polarization dependent, determined as 4.2 and 2.4 for TE and TM polarizations, respectively, and was in good agreement with numerical results. The thin-film-based field enhancement was also applied to live-cell imaging of quantum dots, which confirmed the sensitivity enhancement qualitatively.

AB - We investigated experimentally the evanescent field enhancement based on dielectric thin films in total internal reflection microscopy. The sample employed two layers of Al2O3 and SiO2 deposited on an SF10 glass substrate. Field intensity enhancement measured by fluorescent excitation of microbeads relative to that of a control sample without dielectric films was polarization dependent, determined as 4.2 and 2.4 for TE and TM polarizations, respectively, and was in good agreement with numerical results. The thin-film-based field enhancement was also applied to live-cell imaging of quantum dots, which confirmed the sensitivity enhancement qualitatively.

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JO - Optics Letters

JF - Optics Letters

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Thin-film-based sensitivity enhancement for total internal reflection fluorescence live-cell imaging

Abstract

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