Thermal stability and structural characteristics of HfO2 films on Si (100) grown by atomic-layer deposition

M. H. Cho, Y. S. Roh, C. N. Whang, K. Jeong, S. W. Nahm, D. H. Ko, J. H. Lee, N. I. Lee, K. Fujihara

Research output: Contribution to journal › Article › peer-review

350 Citations (Scopus)

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