The Precursor Adsorption Mechanism, Growth Characteristics and Electrical Properties of Plasma-Enhanced Atomic Layer Deposited Tungsten Films by Using Tungsten Chloride Precursors

Seunggi Seo, Yujin Lee, Il Kwon Oh, Bonggeun Shong, Hwi Yoon, Sanghun Lee, Hyungjun Kim

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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