@inproceedings{a0c66ba5954743a29700e27caa9eaa3a,
title = "The benefits of atomic layer deposition in non-semiconductor applications; producing metallic nanomaterials and fabrication of flexible display",
abstract = "Atomic layer deposition (ALD) is a promising deposition technique for nanoscale device fabrication due to its great benefits including excellent conformality, atomic scale thickness control, high quality deposition at low growth temperature, and large area uniformity. In this presentation, we will present a couple of examples for novel applications of ALD; metallic nanomaterial fabrications combined by nanotemplate utilizing the excellent conformality of ALD and fabrication of driving devices for transparent flexible displays utilizing the ability of ALD to produce high quality materials at low growth temperature. These examples manifest the benefits of ALD in the near future industry.",
author = "Hyungjun Kim and Kim, {Woo Hee} and Lee, {Han Bo Ram} and Lim, {S. J.}",
year = "2009",
doi = "10.1149/1.3205047",
language = "English",
isbn = "9781566777414",
series = "ECS Transactions",
publisher = "Electrochemical Society Inc.",
number = "4",
pages = "101--111",
booktitle = "ECS Transactions - Atomic Layer Deposition Applications 5",
edition = "4",
note = "5th Symposium on Atomic Layer Deposition - 216th Meeting of the Electrochemical Society ; Conference date: 05-10-2009 Through 07-10-2009",
}