TY - GEN
T1 - The application of atomic layer deposition for low dimensional nanomaterial synthesis
AU - Kim, Hyungjun
PY - 2010
Y1 - 2010
N2 - Atomic layer deposition (ALD) has been considered as a promising thin film deposition technique for nanoscale semiconductor device fabrication. Recently, however, the exclusive benefits of ALD make it viable tool for nanotechnology. In this presentation, I will present several examples on the application of ALD for low dimensional nanomaterial synthesis. Due to its excellent conformality, ALD is an ideal technique to produce nanomaterials with combination of nanopatterning techniques. Utilizing highly conformai ZnO ALD on the nanohole arrays made by anodized aluminum oxide nanotemplates, low dimensional nanostructures were fabricated and applied for the fabrication of high performance gas sensor. Also, using highly conformai transition metal ALD processes followed by annealing, silicide nanowires were synthesized. Moreover, by adding SiH4 to the NH3 plasma reactant during Co plasma-enhanced ALD process, Co nanorod array was formed on Si substrates without using nanotemplates.
AB - Atomic layer deposition (ALD) has been considered as a promising thin film deposition technique for nanoscale semiconductor device fabrication. Recently, however, the exclusive benefits of ALD make it viable tool for nanotechnology. In this presentation, I will present several examples on the application of ALD for low dimensional nanomaterial synthesis. Due to its excellent conformality, ALD is an ideal technique to produce nanomaterials with combination of nanopatterning techniques. Utilizing highly conformai ZnO ALD on the nanohole arrays made by anodized aluminum oxide nanotemplates, low dimensional nanostructures were fabricated and applied for the fabrication of high performance gas sensor. Also, using highly conformai transition metal ALD processes followed by annealing, silicide nanowires were synthesized. Moreover, by adding SiH4 to the NH3 plasma reactant during Co plasma-enhanced ALD process, Co nanorod array was formed on Si substrates without using nanotemplates.
UR - http://www.scopus.com/inward/record.url?scp=84863179145&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84863179145&partnerID=8YFLogxK
U2 - 10.1149/1.3193683
DO - 10.1149/1.3193683
M3 - Conference contribution
AN - SCOPUS:84863179145
SN - 9781607681786
T3 - ECS Transactions
SP - 57
EP - 63
BT - Low-Dimensional Nanoscale Electronic and Photonic Devices 4
PB - Electrochemical Society Inc.
T2 - Low-Dimensional Nanoscale Electronic and Photonic Devices 4 - 218th ECS Meeting
Y2 - 10 October 2010 through 15 October 2010
ER -