The effective synthesis of two-dimensional (2D) heterostructures is essential for their use in electronic devices. In this study, by using atomic layer deposition (ALD), 2D transition metal dichalcogenide (TMD) heterostructures were grown by a halide precursor. This study shows the growth characteristics of the fluoride precursor compared to the chloride precursor used for the synthesis of the TMD on the graphene layer and the other TMD layer. Additionally, a carbonyl precursor was used for comparison with the halide precursor in terms of the thermal stability. From these experiments, the fluoride precursor was adequate for synthesizing on the graphene, however, was inappropriate for the TMD/TMD heterostructure because of its etching characteristic. Meanwhile, the chloride precursor was appropriate for the TMD/TMD heterostructure, even for a low binding energy with the substrate, but was inadequate in forming the TMD/graphene heterostructure, even if the ALD cycle increased. Through our experiments, we show, for the first time, that there exists a suitable halide precursor for a 2D layer for a substrate.
|Number of pages||9|
|Journal||Applied Surface Science|
|Publication status||Published - 2019 Nov 15|
Bibliographical noteFunding Information:
This work was supported by the Materials and Components Technology Development Program of MOTIE / KEIT . [10080527, Development of commercialization technology of highly sensitive gas sensor based on chalcogenide 2D nanomaterial], by the Commercialization Promotion Agency for R&D Outcomes(COMPA) funded by the Ministry of Science and ICT (MSIT). [Development of Plasma-based Synthesis Equipment and Process for Two-Dimensional TMDCs], by Samsung Display CO., LTD., and by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( NRF-2015R1D1A1A01060064 ), under the framework of international cooperation program managed by the National Research Foundation of Korea ( NRF-2018K2A9A1A01090484 ), by the research fund of Hanyang University ( HY-2019-N ) and thanks to Air Liquide for providing the MoF 6 precursor.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films