@inproceedings{07265528e5fa46e4a5c1d2ede774b8cd,
title = "Surface modified SiO2 xerogel films from HMDS/Acetone for intermetal dielectrics",
abstract = "In this study, a novel sol-gel synthesis procedure using HMDS as surface modifier and acetone as solvent without solvent exchange step for the preparation of SiO2 xerogel thin film is proposed. The concentration of modifying agent as HMDS was also optimized for the high porous SiO2 xerogel film. The microstructural and electrical properties of SiO2 xerogel films for applications as intermetal dielectrics according to the new method were studied.",
author = "Kim, {Hong Ryul} and Park, {Hyung Ho}",
year = "2000",
doi = "10.1109/IMNC.2000.872720",
language = "English",
series = "Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "218--219",
booktitle = "Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000",
address = "United States",
note = "International Microprocesses and Nanotechnology Conference, MNC 2000 ; Conference date: 11-07-2000 Through 13-07-2000",
}