The purpose of this study was to apply nanotechnology to dental implant for improved osseointegration. Titania nanostructures were fabricated on the sand blasted with large grit and acid etched (SA) titanium (ASTM grade 4) implants (TSIII SA®, Osstem, 3.5 x 5 mm) using potentiostatic anodic oxidation in HF. The nanostructures were uniformly formed on the SA surface. The mean pore size of nanostructure was about 30 nm. In the result of torque test, the nanostructure formed on SA surface was preserved from the torque, even after the loading of 40Ncm. An amorphous titania nanostructure was annealed at 400 °C. Through heat treatment, the amorphous titania nanostructure was turned into anatase phase. Hydrofluoric acid was used as the electrolyte to form nanostructure. In the result of ion release test, however, fluoride ions were not detected at the heat treated group. Therefore, such nanostructured SA implant (Nano-SA) will be suitable for dental implant.