Thin films of amorphous hydrogenated carbon nitride (a-CNx : H) were deposited from CH4 and N2 gases by plasma-enhanced chemical vapor deposition using a helical resonator discharge. The effects of substrate temperature on the structural and optical properties of the films have been systematically investigated by Raman spectroscopy and transmission ultraviolet-visible spectroscopy. The optical band gap of the a-CNx : H films was found to decrease from 1.72 to 0.95 eV as the substrate temperature is increased to 250°C. Through the relationship between optical band gap and Raman studies, it could be concluded that a progressive graphitization of the films occurs with increasing the substrate temperature.
|Number of pages||4|
|Journal||Solid State Communications|
|Publication status||Published - 1997 Dec|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Materials Chemistry