Structural and optical properties of amorphous hydrogenated carbon nitride films prepared by plasma-enhanced chemical vapor deposition

Joo Han Kim; Hong Koo Baik

doi:10.1016/S0038-1098(97)00399-2

Structural and optical properties of amorphous hydrogenated carbon nitride films prepared by plasma-enhanced chemical vapor deposition

Joo Han Kim, Hong Koo Baik

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Thin films of amorphous hydrogenated carbon nitride (a-CN_x : H) were deposited from CH₄ and N₂ gases by plasma-enhanced chemical vapor deposition using a helical resonator discharge. The effects of substrate temperature on the structural and optical properties of the films have been systematically investigated by Raman spectroscopy and transmission ultraviolet-visible spectroscopy. The optical band gap of the a-CN_x : H films was found to decrease from 1.72 to 0.95 eV as the substrate temperature is increased to 250°C. Through the relationship between optical band gap and Raman studies, it could be concluded that a progressive graphitization of the films occurs with increasing the substrate temperature.

Original language	English
Pages (from-to)	653-656
Number of pages	4
Journal	Solid State Communications
Volume	104
Issue number	11
DOIs	https://doi.org/10.1016/S0038-1098(97)00399-2
Publication status	Published - 1997 Dec

All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Materials Chemistry

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10.1016/S0038-1098(97)00399-2

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abstract = "Thin films of amorphous hydrogenated carbon nitride (a-CNx : H) were deposited from CH4 and N2 gases by plasma-enhanced chemical vapor deposition using a helical resonator discharge. The effects of substrate temperature on the structural and optical properties of the films have been systematically investigated by Raman spectroscopy and transmission ultraviolet-visible spectroscopy. The optical band gap of the a-CNx : H films was found to decrease from 1.72 to 0.95 eV as the substrate temperature is increased to 250°C. Through the relationship between optical band gap and Raman studies, it could be concluded that a progressive graphitization of the films occurs with increasing the substrate temperature.",

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AU - Baik, Hong Koo

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N2 - Thin films of amorphous hydrogenated carbon nitride (a-CNx : H) were deposited from CH4 and N2 gases by plasma-enhanced chemical vapor deposition using a helical resonator discharge. The effects of substrate temperature on the structural and optical properties of the films have been systematically investigated by Raman spectroscopy and transmission ultraviolet-visible spectroscopy. The optical band gap of the a-CNx : H films was found to decrease from 1.72 to 0.95 eV as the substrate temperature is increased to 250°C. Through the relationship between optical band gap and Raman studies, it could be concluded that a progressive graphitization of the films occurs with increasing the substrate temperature.

AB - Thin films of amorphous hydrogenated carbon nitride (a-CNx : H) were deposited from CH4 and N2 gases by plasma-enhanced chemical vapor deposition using a helical resonator discharge. The effects of substrate temperature on the structural and optical properties of the films have been systematically investigated by Raman spectroscopy and transmission ultraviolet-visible spectroscopy. The optical band gap of the a-CNx : H films was found to decrease from 1.72 to 0.95 eV as the substrate temperature is increased to 250°C. Through the relationship between optical band gap and Raman studies, it could be concluded that a progressive graphitization of the films occurs with increasing the substrate temperature.

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IS - 11

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Structural and optical properties of amorphous hydrogenated carbon nitride films prepared by plasma-enhanced chemical vapor deposition

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