Abstract
Si-rich SiO2 (SRSO) films were prepared by RF magnetron sputter techniques, and the structural and optical features of nanocrystalline Si (nc-Si) embedded in the SiO2 matrix were investigated in terms of post-deposition heat-treatment conditions. The SRSO thin films exhibited PL phenomena in the wavelength range of (450 - 500 nm). Post-deposition heat-treatment at relatively high temperature like 1000 - 1100°C increased the crystallinity of the films as well as the volume of the Si nanocrystallites (and SiO2), and as a result, PL intensity was enhanced in the visible light region. The nc-Si embedded in SiO2 matrix is a few nanometers in size. It is believed that the Si nanocrystallites in the post-deposition annealed films are isolated and well passivated by SiO2.
Original language | English |
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Pages (from-to) | 949-952 |
Number of pages | 4 |
Journal | Materials Science Forum |
Volume | 449-452 |
Issue number | II |
Publication status | Published - 2004 |
Event | Designing, Processing and Properties of Advanced Engineering Materials: Proceedings on the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials - Jeju Island, Korea, Republic of Duration: 2003 Nov 5 → 2003 Nov 8 |
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering