Structural and optical features of Si-rich SiO2 films prepared by magnetron sputter techniques

S. W. Kim; N. H. Cho; Seongil Im

Structural and optical features of Si-rich SiO₂ films prepared by magnetron sputter techniques

S. W. Kim, N. H. Cho, Seongil Im

Department of Physics

Research output: Contribution to journal › Conference article › peer-review

1 Citation (Scopus)

Abstract

Si-rich SiO₂ (SRSO) films were prepared by RF magnetron sputter techniques, and the structural and optical features of nanocrystalline Si (nc-Si) embedded in the SiO₂ matrix were investigated in terms of post-deposition heat-treatment conditions. The SRSO thin films exhibited PL phenomena in the wavelength range of (450 - 500 nm). Post-deposition heat-treatment at relatively high temperature like 1000 - 1100°C increased the crystallinity of the films as well as the volume of the Si nanocrystallites (and SiO₂), and as a result, PL intensity was enhanced in the visible light region. The nc-Si embedded in SiO₂ matrix is a few nanometers in size. It is believed that the Si nanocrystallites in the post-deposition annealed films are isolated and well passivated by SiO₂.

Original language	English
Pages (from-to)	949-952
Number of pages	4
Journal	Materials Science Forum
Volume	449-452
Issue number	II
Publication status	Published - 2004
Event	Designing, Processing and Properties of Advanced Engineering Materials: Proceedings on the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials - Jeju Island, Korea, Republic of Duration: 2003 Nov 5 → 2003 Nov 8

All Science Journal Classification (ASJC) codes

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Cite this

@article{0359c569d58a4d33a9f91de2eeeda2ce,

title = "Structural and optical features of Si-rich SiO2 films prepared by magnetron sputter techniques",

abstract = "Si-rich SiO2 (SRSO) films were prepared by RF magnetron sputter techniques, and the structural and optical features of nanocrystalline Si (nc-Si) embedded in the SiO2 matrix were investigated in terms of post-deposition heat-treatment conditions. The SRSO thin films exhibited PL phenomena in the wavelength range of (450 - 500 nm). Post-deposition heat-treatment at relatively high temperature like 1000 - 1100°C increased the crystallinity of the films as well as the volume of the Si nanocrystallites (and SiO2), and as a result, PL intensity was enhanced in the visible light region. The nc-Si embedded in SiO2 matrix is a few nanometers in size. It is believed that the Si nanocrystallites in the post-deposition annealed films are isolated and well passivated by SiO2.",

keywords = "Nanocrystalline Si, Photoluminescence, SRSO films, SiO",

author = "Kim, {S. W.} and Cho, {N. H.} and Seongil Im",

year = "2004",

language = "English",

volume = "449-452",

pages = "949--952",

journal = "Materials Science Forum",

issn = "0255-5476",

publisher = "Trans Tech Publications Ltd",

number = "II",

note = "Designing, Processing and Properties of Advanced Engineering Materials: Proceedings on the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials ; Conference date: 05-11-2003 Through 08-11-2003",

}

TY - JOUR

T1 - Structural and optical features of Si-rich SiO2 films prepared by magnetron sputter techniques

AU - Kim, S. W.

AU - Cho, N. H.

AU - Im, Seongil

PY - 2004

Y1 - 2004

N2 - Si-rich SiO2 (SRSO) films were prepared by RF magnetron sputter techniques, and the structural and optical features of nanocrystalline Si (nc-Si) embedded in the SiO2 matrix were investigated in terms of post-deposition heat-treatment conditions. The SRSO thin films exhibited PL phenomena in the wavelength range of (450 - 500 nm). Post-deposition heat-treatment at relatively high temperature like 1000 - 1100°C increased the crystallinity of the films as well as the volume of the Si nanocrystallites (and SiO2), and as a result, PL intensity was enhanced in the visible light region. The nc-Si embedded in SiO2 matrix is a few nanometers in size. It is believed that the Si nanocrystallites in the post-deposition annealed films are isolated and well passivated by SiO2.

AB - Si-rich SiO2 (SRSO) films were prepared by RF magnetron sputter techniques, and the structural and optical features of nanocrystalline Si (nc-Si) embedded in the SiO2 matrix were investigated in terms of post-deposition heat-treatment conditions. The SRSO thin films exhibited PL phenomena in the wavelength range of (450 - 500 nm). Post-deposition heat-treatment at relatively high temperature like 1000 - 1100°C increased the crystallinity of the films as well as the volume of the Si nanocrystallites (and SiO2), and as a result, PL intensity was enhanced in the visible light region. The nc-Si embedded in SiO2 matrix is a few nanometers in size. It is believed that the Si nanocrystallites in the post-deposition annealed films are isolated and well passivated by SiO2.

KW - Nanocrystalline Si

KW - Photoluminescence

KW - SRSO films

KW - SiO

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M3 - Conference article

AN - SCOPUS:18744426087

SN - 0255-5476

VL - 449-452

SP - 949

EP - 952

JO - Materials Science Forum

JF - Materials Science Forum

IS - II

T2 - Designing, Processing and Properties of Advanced Engineering Materials: Proceedings on the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials

Y2 - 5 November 2003 through 8 November 2003

ER -

Structural and optical features of Si-rich SiO₂ films prepared by magnetron sputter techniques

Abstract

All Science Journal Classification (ASJC) codes

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