Strong hydrophobizer: Laterally chemisorbed low-molecular-weight polydimethylsiloxane

Soo Sang Chae; Jin Young Oh; Jee Ho Park; Won Jin Choi; Jeong Hwan Han; Jeong O. Lee; Hong Koo Baik; Tae Il Lee

doi:10.1039/c5cc00066a

Strong hydrophobizer: Laterally chemisorbed low-molecular-weight polydimethylsiloxane

Soo Sang Chae, Jin Young Oh, Jee Ho Park, Won Jin Choi, Jeong Hwan Han, Jeong O. Lee, Hong Koo Baik, Tae Il Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

We introduce a siloxane chain-based hydrophobizer that exhibits superior thermal and chemical stability compared to the conventional hydrophobizing silane agent under conditions of over 300°C and pH 2-13. To demonstrate the capability of the siloxane chain-based hydrophobizer to serve as a highly robust chemical surface modifier, we present two applications: the formation of fine metal nanoparticles with a narrow size distribution by thermal aggregation of a metal thin film and the selective deposition of a ruthenium thin film by atomic layer deposition.

Original language	English
Pages (from-to)	5844-5847
Number of pages	4
Journal	Chemical Communications
Volume	51
Issue number	27
DOIs	https://doi.org/10.1039/c5cc00066a
Publication status	Published - 2015 Apr 7

Bibliographical note

Publisher Copyright:
© The Royal Society of Chemistry 2015.

All Science Journal Classification (ASJC) codes

Catalysis
Electronic, Optical and Magnetic Materials
Ceramics and Composites
Chemistry(all)
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1039/c5cc00066a

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abstract = "We introduce a siloxane chain-based hydrophobizer that exhibits superior thermal and chemical stability compared to the conventional hydrophobizing silane agent under conditions of over 300°C and pH 2-13. To demonstrate the capability of the siloxane chain-based hydrophobizer to serve as a highly robust chemical surface modifier, we present two applications: the formation of fine metal nanoparticles with a narrow size distribution by thermal aggregation of a metal thin film and the selective deposition of a ruthenium thin film by atomic layer deposition.",

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T1 - Strong hydrophobizer

T2 - Laterally chemisorbed low-molecular-weight polydimethylsiloxane

AU - Chae, Soo Sang

AU - Oh, Jin Young

AU - Park, Jee Ho

AU - Choi, Won Jin

AU - Han, Jeong Hwan

AU - Lee, Jeong O.

AU - Baik, Hong Koo

AU - Lee, Tae Il

PY - 2015/4/7

Y1 - 2015/4/7

N2 - We introduce a siloxane chain-based hydrophobizer that exhibits superior thermal and chemical stability compared to the conventional hydrophobizing silane agent under conditions of over 300°C and pH 2-13. To demonstrate the capability of the siloxane chain-based hydrophobizer to serve as a highly robust chemical surface modifier, we present two applications: the formation of fine metal nanoparticles with a narrow size distribution by thermal aggregation of a metal thin film and the selective deposition of a ruthenium thin film by atomic layer deposition.

AB - We introduce a siloxane chain-based hydrophobizer that exhibits superior thermal and chemical stability compared to the conventional hydrophobizing silane agent under conditions of over 300°C and pH 2-13. To demonstrate the capability of the siloxane chain-based hydrophobizer to serve as a highly robust chemical surface modifier, we present two applications: the formation of fine metal nanoparticles with a narrow size distribution by thermal aggregation of a metal thin film and the selective deposition of a ruthenium thin film by atomic layer deposition.

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JF - Chemical Communications

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Strong hydrophobizer: Laterally chemisorbed low-molecular-weight polydimethylsiloxane

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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