Statistical modeling of the electrical characteristics for HfO2 thin films grown by MOMBE for high-k dielectric applications

Jung Hwan Lee; Kyoung Eun Kweon; Young Don Ko; Tae Hyoung Moon; Jae Min Myoung; Ilgu Yun

doi:10.1016/j.jmatprotec.2007.10.045

Statistical modeling of the electrical characteristics for HfO₂ thin films grown by MOMBE for high-k dielectric applications

Jung Hwan Lee, Kyoung Eun Kweon, Young Don Ko, Tae Hyoung Moon, Jae Min Myoung, Ilgu Yun

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

In this paper, the multiple regression model of electrical characteristics for HfO₂ thin films grown by metal organic molecular beam epitaxy (MOMBE) was investigated. The electrical properties, such as the accumulation capacitance and the hysteresis index, are the main factors to determine the characteristics of HfO₂. The input process parameters were extracted by analyzing the process conditions and the characterization of the films. X-ray diffraction was measured to analyze the variation of the characteristics on the various process conditions. In order to build the process model, the multiple regression models were carried out using the design of experiments. The analysis of variance and the effect plots were used to analyze the significance level and the relationship between the process parameters and the responses.

Original language	English
Pages (from-to)	454-460
Number of pages	7
Journal	Journal of Materials Processing Technology
Volume	203
Issue number	1-3
DOIs	https://doi.org/10.1016/j.jmatprotec.2007.10.045
Publication status	Published - 2008 Jul 18

Bibliographical note

Funding Information:
This work was supported by Yonsei University Institute of TMS Information Technology, a Brain Korea 21 program, Korea and by the Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea government (MOST) (No. R01-2007-000-20143-0).

All Science Journal Classification (ASJC) codes

Ceramics and Composites
Computer Science Applications
Metals and Alloys
Industrial and Manufacturing Engineering

Access to Document

10.1016/j.jmatprotec.2007.10.045

Cite this

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title = "Statistical modeling of the electrical characteristics for HfO2 thin films grown by MOMBE for high-k dielectric applications",

abstract = "In this paper, the multiple regression model of electrical characteristics for HfO2 thin films grown by metal organic molecular beam epitaxy (MOMBE) was investigated. The electrical properties, such as the accumulation capacitance and the hysteresis index, are the main factors to determine the characteristics of HfO2. The input process parameters were extracted by analyzing the process conditions and the characterization of the films. X-ray diffraction was measured to analyze the variation of the characteristics on the various process conditions. In order to build the process model, the multiple regression models were carried out using the design of experiments. The analysis of variance and the effect plots were used to analyze the significance level and the relationship between the process parameters and the responses.",

author = "Lee, {Jung Hwan} and Kweon, {Kyoung Eun} and Ko, {Young Don} and Moon, {Tae Hyoung} and Myoung, {Jae Min} and Ilgu Yun",

note = "Funding Information: This work was supported by Yonsei University Institute of TMS Information Technology, a Brain Korea 21 program, Korea and by the Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea government (MOST) (No. R01-2007-000-20143-0).",

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AU - Lee, Jung Hwan

AU - Kweon, Kyoung Eun

AU - Ko, Young Don

AU - Moon, Tae Hyoung

AU - Myoung, Jae Min

AU - Yun, Ilgu

N1 - Funding Information: This work was supported by Yonsei University Institute of TMS Information Technology, a Brain Korea 21 program, Korea and by the Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea government (MOST) (No. R01-2007-000-20143-0).

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Y1 - 2008/7/18

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