Spatially resolvable optical emission spectrometer for analyzing density uniformity of semiconductor process plasma

Changhoon Oh; Hoonchul Ryoo; Hyungwoo Lee; Se Yeon Kim; Hun Jung Yi; Jae W. Hahn

doi:10.1063/1.3488104

Spatially resolvable optical emission spectrometer for analyzing density uniformity of semiconductor process plasma

Changhoon Oh, Hoonchul Ryoo, Hyungwoo Lee, Se Yeon Kim, Hun Jung Yi, Jae W. Hahn

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

We proposed a spatially resolved optical emission spectrometer (SROES) for analyzing the uniformity of plasma density for semiconductor processes. To enhance the spatial resolution of the SROES, we constructed a SROES system using a series of lenses, apertures, and pinholes. We calculated the spatial resolution of the SROES for the variation of pinhole size, and our calculated results were in good agreement with the measured spatial variation of the constructed SROES. The performance of the SROES was also verified by detecting the correlation between the distribution of a fluorine radical in inductively coupled plasma etch process and the etch rate of a SiO₂ film on a silicon wafer.

Original language	English
Article number	103109
Journal	Review of Scientific Instruments
Volume	81
Issue number	10
DOIs	https://doi.org/10.1063/1.3488104
Publication status	Published - 2010 Oct

Bibliographical note

Funding Information:
This work was supported in part by the Samsung Electronics and in part by the Ministry of Knowledge Economy of Korea (Project No. 10031812-2009-12).

All Science Journal Classification (ASJC) codes

Instrumentation

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10.1063/1.3488104

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abstract = "We proposed a spatially resolved optical emission spectrometer (SROES) for analyzing the uniformity of plasma density for semiconductor processes. To enhance the spatial resolution of the SROES, we constructed a SROES system using a series of lenses, apertures, and pinholes. We calculated the spatial resolution of the SROES for the variation of pinhole size, and our calculated results were in good agreement with the measured spatial variation of the constructed SROES. The performance of the SROES was also verified by detecting the correlation between the distribution of a fluorine radical in inductively coupled plasma etch process and the etch rate of a SiO2 film on a silicon wafer.",

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AU - Oh, Changhoon

AU - Ryoo, Hoonchul

AU - Lee, Hyungwoo

AU - Kim, Se Yeon

AU - Yi, Hun Jung

AU - Hahn, Jae W.

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N2 - We proposed a spatially resolved optical emission spectrometer (SROES) for analyzing the uniformity of plasma density for semiconductor processes. To enhance the spatial resolution of the SROES, we constructed a SROES system using a series of lenses, apertures, and pinholes. We calculated the spatial resolution of the SROES for the variation of pinhole size, and our calculated results were in good agreement with the measured spatial variation of the constructed SROES. The performance of the SROES was also verified by detecting the correlation between the distribution of a fluorine radical in inductively coupled plasma etch process and the etch rate of a SiO2 film on a silicon wafer.

AB - We proposed a spatially resolved optical emission spectrometer (SROES) for analyzing the uniformity of plasma density for semiconductor processes. To enhance the spatial resolution of the SROES, we constructed a SROES system using a series of lenses, apertures, and pinholes. We calculated the spatial resolution of the SROES for the variation of pinhole size, and our calculated results were in good agreement with the measured spatial variation of the constructed SROES. The performance of the SROES was also verified by detecting the correlation between the distribution of a fluorine radical in inductively coupled plasma etch process and the etch rate of a SiO2 film on a silicon wafer.

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Spatially resolvable optical emission spectrometer for analyzing density uniformity of semiconductor process plasma

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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