Soluble polycyclosilane-polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

Sung Jin Park; Hyeon Mo Cho; Myong Euy Lee; Miyoung Kim; Kwenwoo Han; Seunghee Hong; Sanghak Lim; Hansong Lee; Byeonggyu Hwang; Sang Kyun Kim; Sangdeok Shim; Philjae Kang; Moon Gun Choi

doi:10.1039/c4tc01917b

Soluble polycyclosilane-polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

Sung Jin Park, Hyeon Mo Cho, Myong Euy Lee, Miyoung Kim, Kwenwoo Han, Seunghee Hong, Sanghak Lim, Hansong Lee, Byeonggyu Hwang, Sang Kyun Kim, Sangdeok Shim, Philjae Kang, Moon Gun Choi

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

A polycyclosilane precursor was synthesized to develop soluble silicon materials and silicon thin films with optical properties at 193 nm, high silicon content, and etch selectivity for O₂ and CF_x plasmas. A new class of polycyclosilane-polysiloxane hybrid materials and their thin films exhibited good etch selectivity and good optical properties at 193 nm without organic absorbents.

Original language	English
Pages (from-to)	239-242
Number of pages	4
Journal	Journal of Materials Chemistry C
Volume	3
Issue number	2
DOIs	https://doi.org/10.1039/c4tc01917b
Publication status	Published - 2015 Jan 14

Bibliographical note

Publisher Copyright:
© 2015 The Royal Society of Chemistry.

All Science Journal Classification (ASJC) codes

Chemistry(all)
Materials Chemistry

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10.1039/c4tc01917b

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title = "Soluble polycyclosilane-polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity",

abstract = "A polycyclosilane precursor was synthesized to develop soluble silicon materials and silicon thin films with optical properties at 193 nm, high silicon content, and etch selectivity for O2 and CFx plasmas. A new class of polycyclosilane-polysiloxane hybrid materials and their thin films exhibited good etch selectivity and good optical properties at 193 nm without organic absorbents.",

author = "Park, {Sung Jin} and Cho, {Hyeon Mo} and Lee, {Myong Euy} and Miyoung Kim and Kwenwoo Han and Seunghee Hong and Sanghak Lim and Hansong Lee and Byeonggyu Hwang and Kim, {Sang Kyun} and Sangdeok Shim and Philjae Kang and Choi, {Moon Gun}",

note = "Publisher Copyright: {\textcopyright} 2015 The Royal Society of Chemistry.",

year = "2015",

month = jan,

day = "14",

doi = "10.1039/c4tc01917b",

language = "English",

volume = "3",

pages = "239--242",

journal = "Journal of Materials Chemistry C",

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publisher = "Royal Society of Chemistry",

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TY - JOUR

T1 - Soluble polycyclosilane-polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

AU - Park, Sung Jin

AU - Cho, Hyeon Mo

AU - Lee, Myong Euy

AU - Kim, Miyoung

AU - Han, Kwenwoo

AU - Hong, Seunghee

AU - Lim, Sanghak

AU - Lee, Hansong

AU - Hwang, Byeonggyu

AU - Kim, Sang Kyun

AU - Shim, Sangdeok

AU - Kang, Philjae

AU - Choi, Moon Gun

PY - 2015/1/14

Y1 - 2015/1/14

N2 - A polycyclosilane precursor was synthesized to develop soluble silicon materials and silicon thin films with optical properties at 193 nm, high silicon content, and etch selectivity for O2 and CFx plasmas. A new class of polycyclosilane-polysiloxane hybrid materials and their thin films exhibited good etch selectivity and good optical properties at 193 nm without organic absorbents.

AB - A polycyclosilane precursor was synthesized to develop soluble silicon materials and silicon thin films with optical properties at 193 nm, high silicon content, and etch selectivity for O2 and CFx plasmas. A new class of polycyclosilane-polysiloxane hybrid materials and their thin films exhibited good etch selectivity and good optical properties at 193 nm without organic absorbents.

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U2 - 10.1039/c4tc01917b

DO - 10.1039/c4tc01917b

M3 - Article

AN - SCOPUS:84917729910

SN - 2050-7534

VL - 3

SP - 239

EP - 242

JO - Journal of Materials Chemistry C

JF - Journal of Materials Chemistry C

IS - 2

ER -

Soluble polycyclosilane-polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

Abstract

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