Soft magnetic properties and microstructures of FeRhN high moment thin films

Jongill Hong, Kyusik Sin, Lee Nguyentran, Shan X. Wang

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


High moment FeRhN films with soft magnetic properties have been fabricated by reactive RF sputtering. The magnetic properties and microstructures of the FeRhN films are similar to those of FeN films, but the sputtering parameters for the minimum coercivity are somewhat shifted. The addition of Rh results in slightly increased saturation magnetostriction at a given \2/Ar flow rate ratio. It is confirmed by High Resolution Transmission Electron Microscopy (HREM) that small grains are important to obtain soft magnetic properties in FeRhN films deposited on alumina coated AC-TiC (AlTiC) composite substrates. It is also observed that the grain size of the Y"-(FeRh)4N phase does not differ much from that of the oc-(FeRhN) solid solution phase near the optimized N2/Ar flow rate ratio.

Original languageEnglish
Pages (from-to)2845-2847
Number of pages3
JournalIEEE Transactions on Magnetics
Issue number5 PART 1
Publication statusPublished - 1997

Bibliographical note

Funding Information:
Jongill Hong, 41 5-723-2939, fax 41 5-725-5457, Shan X. Wang, 415-723-8671, fax 415-725-4034, This work is partially supported by the NSF grant ECS-9409805, and has benefited from the facilities made available to Stanford University by the NSF-MRSEC program through the Center for Materials Research.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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