Silicone engineered anisotropic lithography for ultrahigh-density OLEDs

Hyukmin Kweon, Keun Yeong Choi, Han Wool Park, Ryungyu Lee, Ukjin Jeong, Min Jung Kim, Hyunmin Hong, Borina Ha, Sein Lee, Jang Yeon Kwon, Kwun Bum Chung, Moon Sung Kang, Hojin Lee, Do Hwan Kim

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of organic light-emitting diodes (OLEDs) from mobile and TV displays into near-to-eye microdisplays. However, current patterning techniques so far suffer from low resolution, consecutive pattern for RGB pixelation, low pattern fidelity, and throughput issue. Here, we present a silicone engineered anisotropic lithography of the organic light-emitting semiconductor (OLES) that in-situ forms a non-volatile etch-blocking layer during reactive ion etching. This unique feature not only slows the etch rate but also enhances the anisotropy of etch direction, leading to gain delicate control in forming ultrahigh-density multicolor OLES patterns (up to 4500 pixels per inch) through photolithography. This patterning strategy inspired by silicon etching chemistry is expected to provide new insights into ultrahigh-density OLED microdisplays.

Original languageEnglish
Article number6775
JournalNature communications
Volume13
Issue number1
DOIs
Publication statusPublished - 2022 Dec

Bibliographical note

Publisher Copyright:
© 2022, The Author(s).

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy
  • General Chemistry
  • General Biochemistry,Genetics and Molecular Biology

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