Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography
- Sang Kyun Kim
- , Hyeon Mo Cho
- , Sang Ran Koh
- , Mi Young Kim
- , Hui Chan Yoon
- , Yong Jin Chung
- , Jong Seob Kim
- , Tuwon Chang
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
5
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