Selective area atomic layer deposited ZnO nanodot on self-assembled monolayer pattern using a diblock copolymer nano-template

Doyoung Kim; Jaehong Yoon; Hyungjun Kim

doi:10.1166/jnn.2012.4703

Selective area atomic layer deposited ZnO nanodot on self-assembled monolayer pattern using a diblock copolymer nano-template

Doyoung Kim, Jaehong Yoon, Hyungjun Kim

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

ZnO nanodots were prepared by selective area atomic layer deposition (SA-ALD) on an octadecyltrichlorosilane (ODTS) self-assembly monolayers (SAMs) patterns formed using a diblock co-polymer (DBC) nanotemplate. In order to transfer well-ordered nanaotemplate in SAMs, SiO ₂ sacrificial layer was inserted between DBC and SAMs. Cylindrical nanoholes under 16 nm diameters were wellformed on SiO ₂ layer. SA-ALD of ZnO was successfully performed on by ODTS SAMs.

Original language	English
Pages (from-to)	1483-1486
Number of pages	4
Journal	Journal of Nanoscience and Nanotechnology
Volume	12
Issue number	2
DOIs	https://doi.org/10.1166/jnn.2012.4703
Publication status	Published - 2012

All Science Journal Classification (ASJC) codes

Bioengineering
Chemistry(all)
Biomedical Engineering
Materials Science(all)
Condensed Matter Physics

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@article{aa9365cea046439aa489b7b0b650ee80,

title = "Selective area atomic layer deposited ZnO nanodot on self-assembled monolayer pattern using a diblock copolymer nano-template",

abstract = "ZnO nanodots were prepared by selective area atomic layer deposition (SA-ALD) on an octadecyltrichlorosilane (ODTS) self-assembly monolayers (SAMs) patterns formed using a diblock co-polymer (DBC) nanotemplate. In order to transfer well-ordered nanaotemplate in SAMs, SiO 2 sacrificial layer was inserted between DBC and SAMs. Cylindrical nanoholes under 16 nm diameters were wellformed on SiO 2 layer. SA-ALD of ZnO was successfully performed on by ODTS SAMs.",

author = "Doyoung Kim and Jaehong Yoon and Hyungjun Kim",

year = "2012",

doi = "10.1166/jnn.2012.4703",

language = "English",

volume = "12",

pages = "1483--1486",

journal = "Journal of Nanoscience and Nanotechnology",

issn = "1533-4880",

publisher = "American Scientific Publishers",

number = "2",

}

TY - JOUR

T1 - Selective area atomic layer deposited ZnO nanodot on self-assembled monolayer pattern using a diblock copolymer nano-template

AU - Kim, Doyoung

AU - Yoon, Jaehong

AU - Kim, Hyungjun

PY - 2012

Y1 - 2012

N2 - ZnO nanodots were prepared by selective area atomic layer deposition (SA-ALD) on an octadecyltrichlorosilane (ODTS) self-assembly monolayers (SAMs) patterns formed using a diblock co-polymer (DBC) nanotemplate. In order to transfer well-ordered nanaotemplate in SAMs, SiO 2 sacrificial layer was inserted between DBC and SAMs. Cylindrical nanoholes under 16 nm diameters were wellformed on SiO 2 layer. SA-ALD of ZnO was successfully performed on by ODTS SAMs.

AB - ZnO nanodots were prepared by selective area atomic layer deposition (SA-ALD) on an octadecyltrichlorosilane (ODTS) self-assembly monolayers (SAMs) patterns formed using a diblock co-polymer (DBC) nanotemplate. In order to transfer well-ordered nanaotemplate in SAMs, SiO 2 sacrificial layer was inserted between DBC and SAMs. Cylindrical nanoholes under 16 nm diameters were wellformed on SiO 2 layer. SA-ALD of ZnO was successfully performed on by ODTS SAMs.

UR - http://www.scopus.com/inward/record.url?scp=84861672953&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84861672953&partnerID=8YFLogxK

U2 - 10.1166/jnn.2012.4703

DO - 10.1166/jnn.2012.4703

M3 - Article

C2 - 22629984

AN - SCOPUS:84861672953

SN - 1533-4880

VL - 12

SP - 1483

EP - 1486

JO - Journal of Nanoscience and Nanotechnology

JF - Journal of Nanoscience and Nanotechnology

IS - 2

ER -

Selective area atomic layer deposited ZnO nanodot on self-assembled monolayer pattern using a diblock copolymer nano-template

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