Real-Time Compensation of Simultaneous Errors Induced by Optical Phase Difference and Substrate Motion in Scanning Beam Laser Interference Lithography System

Minsoo Kim; Changsu Park; Soonkyu Je; Hoseung Jang; Chulmin Joo; Shinill Kang

doi:10.1109/TMECH.2018.2841019

Real-Time Compensation of Simultaneous Errors Induced by Optical Phase Difference and Substrate Motion in Scanning Beam Laser Interference Lithography System

Minsoo Kim, Changsu Park, Soonkyu Je, Hoseung Jang, Chulmin Joo, Shinill Kang

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Recent advances in display electronics, and micro- and nanophotonics have prompted development of novel nanofabrication technologies that enable production of high-fidelity periodic patterns over a large-area substrate. Scanning beam laser interference lithography (SBLIL) is a high-speed manufacturing process of such high-precision nanogratings; however, the precision of the nanopatterns produced by the SBLIL is negatively affected by several factors, including mechanical and optical phase jitters. Previous studies have focused on pattern production, but little research has been conducted on the error correction. In this paper, we propose a design methodology for comprehensive and real-time control of substrate motion and optical path difference in SBLIL process. We derived equations that relate SBLIL error sources to control inputs, and implemented the control strategy through acousto optical modulation and piezo electric actuation. The develop scheme was applied to the SBLIL process, and validated by presenting improved nano-pattern uniformity.

Original language	English
Article number	8367853
Pages (from-to)	1491-1500
Number of pages	10
Journal	IEEE/ASME Transactions on Mechatronics
Volume	23
Issue number	4
DOIs	https://doi.org/10.1109/TMECH.2018.2841019
Publication status	Published - 2018 Aug

Bibliographical note

Funding Information:
Manuscript received April 5, 2017; revised August 17, 2017 and March 14, 2018; accepted May 18, 2018. Date of publication May 28, 2018; date of current version August 14, 2018. Recommended by Technical Editor Yanling Tian. This work was supported by the National Research Foundation of Korea (NRF) Grant funded by the Korean Government (MSIP) (No.2015R1A5A1037668). (Minsoo Kim and Changsu Park contributed equally to this work.) (Corresponding authors: Chulmin Joo; Shinill Kang.) M. Kim, C. Park, H. Jang, and C. Joo are with the National Center for Optically-Assisted Mechanical System, School of Mechanical Engineering, Yonsei University, Seoul 03722, South Korea (e-mail: mskim84@yonsei.ac.kr; csonlyone@yonsei.ac.kr; cjoo@yonsei.ac.kr).

Publisher Copyright:
© 1996-2012 IEEE.

All Science Journal Classification (ASJC) codes

Control and Systems Engineering
Computer Science Applications
Electrical and Electronic Engineering

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10.1109/TMECH.2018.2841019

Cite this

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title = "Real-Time Compensation of Simultaneous Errors Induced by Optical Phase Difference and Substrate Motion in Scanning Beam Laser Interference Lithography System",

abstract = "Recent advances in display electronics, and micro- and nanophotonics have prompted development of novel nanofabrication technologies that enable production of high-fidelity periodic patterns over a large-area substrate. Scanning beam laser interference lithography (SBLIL) is a high-speed manufacturing process of such high-precision nanogratings; however, the precision of the nanopatterns produced by the SBLIL is negatively affected by several factors, including mechanical and optical phase jitters. Previous studies have focused on pattern production, but little research has been conducted on the error correction. In this paper, we propose a design methodology for comprehensive and real-time control of substrate motion and optical path difference in SBLIL process. We derived equations that relate SBLIL error sources to control inputs, and implemented the control strategy through acousto optical modulation and piezo electric actuation. The develop scheme was applied to the SBLIL process, and validated by presenting improved nano-pattern uniformity.",

author = "Minsoo Kim and Changsu Park and Soonkyu Je and Hoseung Jang and Chulmin Joo and Shinill Kang",

note = "Funding Information: Manuscript received April 5, 2017; revised August 17, 2017 and March 14, 2018; accepted May 18, 2018. Date of publication May 28, 2018; date of current version August 14, 2018. Recommended by Technical Editor Yanling Tian. This work was supported by the National Research Foundation of Korea (NRF) Grant funded by the Korean Government (MSIP) (No.2015R1A5A1037668). (Minsoo Kim and Changsu Park contributed equally to this work.) (Corresponding authors: Chulmin Joo; Shinill Kang.) M. Kim, C. Park, H. Jang, and C. Joo are with the National Center for Optically-Assisted Mechanical System, School of Mechanical Engineering, Yonsei University, Seoul 03722, South Korea (e-mail: mskim84@yonsei.ac.kr; csonlyone@yonsei.ac.kr; cjoo@yonsei.ac.kr). Publisher Copyright: {\textcopyright} 1996-2012 IEEE.",

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Real-Time Compensation of Simultaneous Errors Induced by Optical Phase Difference and Substrate Motion in Scanning Beam Laser Interference Lithography System

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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