Pulsed laser deposition of ZnO thin films for applications of light emission

Physics

• ZnO 100%
• Thin Films 80%
• Light Emission 80%
• Substrates 80%
• Temperature 60%
• Pulsed Laser Deposition 40%
• Pressure 40%
• Oxygen 40%
• Laser 40%
• Deposition 40%
• Photoluminescence 20%
• Electrical Properties 20%
• Optical Properties 20%
• Flux Density 20%
• YAG Laser 20%
• Utilization 20%
• Independent Variables 20%
• Variations 20%

Chemistry

• Reaction Temperature 60%
• X-Ray Diffraction 60%
• Pulsed Laser Deposition 40%
• Dioxygen 40%
• Pressure 40%
• Wavelength 20%
• Electrical Property 20%
• Optical Property 20%
• Deposition Technique 20%
• Photoluminescence 20%
• Rutherford Backscattering Spectroscopy 20%
• Liquid Film 20%
• Application 20%

Material Science

• Thin Films 80%
• Sapphire 40%
• Liquid Films 20%
• Material 20%