Pulsed DC reactive magnetron sputtering of AlN thin films on high frequency LTCC substrates

Jung W. Lee, Jerome J. Cuomo, Baxter F. Moody, Yong S. Cho, Roupen L. Keusseyan

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)


This preliminary work reports the preparation of AlN thin films on an LTCC (low temperature co-fired ceramics) substrate by pulsed dc reactive magnetron sputtering and the limited characterization focusing on microstructure and crystal orientation. The main focus will be placed on the effects of changing pulsed frequency. The AlN thin film showed good adhesion with the substrate and columnar structures having small grains regardless of pulsed frequency. The crystal orientation of AlN thin films was dependent on pulsed frequency according to the result of XRD patterns. The preferred (002) orientation was obtained at a pulsed frequency of 100 kHz. The broad band of 300 to 650 nm observed in photoluminescence spectrum was believed due to defects associated with the presence of oxygen impurities.

Original languageEnglish
Pages (from-to)139-144
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - 2003
EventMaterials, Integration and Packaging Issues for High - Frequency Devices - Boston, MA, United States
Duration: 2003 Dec 12003 Dec 3

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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