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Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor
So Young Kim, Chunghee Jo, Hyerin Shin, Dongmin Yoon, Donghyuk Shin, Min Ho Cheon, Kyu Beom Lee, Dong Won Seo, Jae Wook Choi, Heungsoo Park, Dae Hong Ko
Research output: Contribution to journal › Article › peer-review
3
Citations
(Scopus)