Abstract
Pressure-assisted capillary force lithography was introduced using a permeable fluoropolymer material as a mold. Slight pressing when combined with a newly developed experimental set-up ensured conformal contact between the stiff fluoropolymer mold and the substrate. The stiff nature of the mold material made it possible to pattern sub-100 nm features.
Original language | English |
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Pages (from-to) | 176-179 |
Number of pages | 4 |
Journal | Advanced Materials |
Volume | 16 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2004 Jan 16 |
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering