Abstract
Nickel-cobalt (Ni-Co) oxide thin films were electrodeposited onto copper substrates in an electrolyte containing cobalt chloride and nickel chloride, and the electrochemical capacitor behaviors of these films were investigated. The XRD pattern revealed that the electrodeposited Ni-Co oxide thin film was comprised of NiCo2O4. In the SEM image, the electrodeposited Ni-Co oxide film was covered with hexagonal and cubical shaped particles. The electrodeposited Ni-Co oxide electrode exhibited a specific capacitance of 148 F/g at a scan rate of 20 mV, and the current density was fairly stable over 200 cycles. The charge-discharge test confirmed that capacitance of the electrodeposited Ni-Co oxide electrode resulted from the electric double layer capacitance and pseudocapacitance.
| Original language | English |
|---|---|
| Pages (from-to) | 1464-1467 |
| Number of pages | 4 |
| Journal | Korean Journal of Chemical Engineering |
| Volume | 28 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 2011 Jun |
Bibliographical note
Funding Information:This work was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (Grant No. 2009-0070734) and an Ajou University Research fellowship of 2010 (Grant No S-2010-G0001-00058).
All Science Journal Classification (ASJC) codes
- Chemistry(all)
- Chemical Engineering(all)