TY - JOUR
T1 - Precise and reversible band gap tuning in single-layer MoSe2 by uniaxial strain
AU - Island, Joshua O.
AU - Kuc, Agnieszka
AU - Diependaal, Erik H.
AU - Bratschitsch, Rudolf
AU - Van Der Zant, Herre S.J.
AU - Heine, Thomas
AU - Castellanos-Gomez, Andres
N1 - Publisher Copyright:
© 2016 The Royal Society of Chemistry.
PY - 2016/2/7
Y1 - 2016/2/7
N2 - We present photoluminescence (PL) spectroscopy measurements of single-layer MoSe2 as a function of uniform uniaxial strain. A simple clamping and bending method is described that allows for application of uniaxial strain to layered, 2D materials with strains up to 1.1% without slippage. Using this technique, we find that the electronic band gap of single layer MoSe2 can be reversibly tuned by -27 ± 2 meV per percent of strain. This is in agreement with our density-functional theory calculations, which estimate a modulation of -32 meV per percent of strain, taking into account the role of deformation of the underlying substrate upon bending. Finally, due to its narrow PL spectra as compared with that of MoS2, we show that MoSe2 provides a more precise determination of small changes in strain making it the ideal 2D material for strain applications.
AB - We present photoluminescence (PL) spectroscopy measurements of single-layer MoSe2 as a function of uniform uniaxial strain. A simple clamping and bending method is described that allows for application of uniaxial strain to layered, 2D materials with strains up to 1.1% without slippage. Using this technique, we find that the electronic band gap of single layer MoSe2 can be reversibly tuned by -27 ± 2 meV per percent of strain. This is in agreement with our density-functional theory calculations, which estimate a modulation of -32 meV per percent of strain, taking into account the role of deformation of the underlying substrate upon bending. Finally, due to its narrow PL spectra as compared with that of MoS2, we show that MoSe2 provides a more precise determination of small changes in strain making it the ideal 2D material for strain applications.
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U2 - 10.1039/c5nr08219f
DO - 10.1039/c5nr08219f
M3 - Article
AN - SCOPUS:84956860081
SN - 2040-3364
VL - 8
SP - 2589
EP - 2593
JO - Nanoscale
JF - Nanoscale
IS - 5
ER -