Plasma-enhanced ALD of TiO2 thin films on SUS 304 stainless steel for photocatalytic application

Chang Soo Lee, Jungwon Kim, J. Y. Son, W. J. Maeng, Du Hwan Jo, Wonyong Choi, Hyungjun Kim

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)


Plasma-enhanced atomic layer deposition (PE-ALD) of TiO2 thin films using Ti(NMe2)4 [tetrakis(dimethylamido) Ti] and O2 plasma were prepared on stainless steel to show the self-cleaning effect. The TiO2 thin films deposited on stainless steel have high growth rate, large surface roughness, and low impurities. The film deposited below 200°C was amorphous, while the films deposited at 300 and 400°C showed anatase and rutile phases, respectively. The contact angle measurements on crystalline PE-ALD TiO2 thin films exhibited superhydrophilicity after UV irradiation. The TiO2 thin film with anatase phase deposited at 300°C showed the highest photocatalytic efficiency, which is higher than on Activ glass or thermal ALD TiO2 films. We suggest that anatase structure and large surface area of TiO2 thin film on stainless steel are the main factors for the high photocatalytic efficiency.

Original languageEnglish
Pages (from-to)D188-D192
JournalJournal of the Electrochemical Society
Issue number5
Publication statusPublished - 2009

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry


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