Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel

Hyemin Kang, Chang Soo Lee, Do Young Kim, Jungwon Kim, Wonyong Choi, Hyungjun Kim

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33 Citations (Scopus)


The thermal atomic layer deposition (Th-ALD) of TiO2 films on stainless steel for use as a photocatalyst was investigated and compared to plasma-enhanced ALD (PE-ALD) using the same precursor. Th-ALD TiO2 films were deposited on stainless steel using a Ti(NMe2)4 [tetrakis(dimethylamido) Ti, TDMAT] precursor. The microstructure of the Th-ALD TiO2 films was greatly dependent on the growth temperature as an amorphous structure was obtained at 200°C and a polycrystalline structure was achieved at temperatures above 300°C. From the contact angle measurement of water, the crystalline TiO2 films exhibited super-hydrophilicity after UV irradiation. The anatase phase of both the Th- and PE-ALD TiO2 films grown on stainless steel showed higher photocatalytic abilities than the rutile phase grown at 400°C. In addition, the anatase PE-ALD TiO2 film demonstrated a higher photocatalytic efficiency than the Th-ALD films. The photocatalytic efficiency of the Th-ALD TiO2 films was investigated as a function of film thickness and it was found that the efficiency was saturated above a film thickness of 120nm.

Original languageEnglish
Pages (from-to)6-11
Number of pages6
JournalApplied Catalysis B: Environmental
Issue number1-2
Publication statusPublished - 2011 Apr 27

Bibliographical note

Funding Information:
This research was supported by the Future-based Technology Development Program (Nano Fields) and Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2010-0020230 , 2010-0024066 ).

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Environmental Science(all)
  • Process Chemistry and Technology


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