Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel

Hyemin Kang; Chang Soo Lee; Do Young Kim; Jungwon Kim; Wonyong Choi; Hyungjun Kim

doi:10.1016/j.apcatb.2011.03.010

Photocatalytic effect of thermal atomic layer deposition of TiO₂ on stainless steel

Hyemin Kang, Chang Soo Lee, Do Young Kim, Jungwon Kim, Wonyong Choi, Hyungjun Kim

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

The thermal atomic layer deposition (Th-ALD) of TiO₂ films on stainless steel for use as a photocatalyst was investigated and compared to plasma-enhanced ALD (PE-ALD) using the same precursor. Th-ALD TiO₂ films were deposited on stainless steel using a Ti(NMe₂)₄ [tetrakis(dimethylamido) Ti, TDMAT] precursor. The microstructure of the Th-ALD TiO₂ films was greatly dependent on the growth temperature as an amorphous structure was obtained at 200°C and a polycrystalline structure was achieved at temperatures above 300°C. From the contact angle measurement of water, the crystalline TiO₂ films exhibited super-hydrophilicity after UV irradiation. The anatase phase of both the Th- and PE-ALD TiO₂ films grown on stainless steel showed higher photocatalytic abilities than the rutile phase grown at 400°C. In addition, the anatase PE-ALD TiO₂ film demonstrated a higher photocatalytic efficiency than the Th-ALD films. The photocatalytic efficiency of the Th-ALD TiO₂ films was investigated as a function of film thickness and it was found that the efficiency was saturated above a film thickness of 120nm.

Original language	English
Pages (from-to)	6-11
Number of pages	6
Journal	Applied Catalysis B: Environmental
Volume	104
Issue number	1-2
DOIs	https://doi.org/10.1016/j.apcatb.2011.03.010
Publication status	Published - 2011 Apr 27

Bibliographical note

Funding Information:
This research was supported by the Future-based Technology Development Program (Nano Fields) and Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2010-0020230 , 2010-0024066 ).

All Science Journal Classification (ASJC) codes

Catalysis
Environmental Science(all)
Process Chemistry and Technology

Access to Document

10.1016/j.apcatb.2011.03.010

Cite this

@article{93f50f2b13d947b888593c5336bf475a,

title = "Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel",

abstract = "The thermal atomic layer deposition (Th-ALD) of TiO2 films on stainless steel for use as a photocatalyst was investigated and compared to plasma-enhanced ALD (PE-ALD) using the same precursor. Th-ALD TiO2 films were deposited on stainless steel using a Ti(NMe2)4 [tetrakis(dimethylamido) Ti, TDMAT] precursor. The microstructure of the Th-ALD TiO2 films was greatly dependent on the growth temperature as an amorphous structure was obtained at 200°C and a polycrystalline structure was achieved at temperatures above 300°C. From the contact angle measurement of water, the crystalline TiO2 films exhibited super-hydrophilicity after UV irradiation. The anatase phase of both the Th- and PE-ALD TiO2 films grown on stainless steel showed higher photocatalytic abilities than the rutile phase grown at 400°C. In addition, the anatase PE-ALD TiO2 film demonstrated a higher photocatalytic efficiency than the Th-ALD films. The photocatalytic efficiency of the Th-ALD TiO2 films was investigated as a function of film thickness and it was found that the efficiency was saturated above a film thickness of 120nm.",

author = "Hyemin Kang and Lee, {Chang Soo} and Kim, {Do Young} and Jungwon Kim and Wonyong Choi and Hyungjun Kim",

note = "Funding Information: This research was supported by the Future-based Technology Development Program (Nano Fields) and Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2010-0020230 , 2010-0024066 ).",

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AU - Kang, Hyemin

AU - Lee, Chang Soo

AU - Kim, Do Young

AU - Kim, Jungwon

AU - Choi, Wonyong

AU - Kim, Hyungjun

N1 - Funding Information: This research was supported by the Future-based Technology Development Program (Nano Fields) and Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2010-0020230 , 2010-0024066 ).

PY - 2011/4/27

Y1 - 2011/4/27

N2 - The thermal atomic layer deposition (Th-ALD) of TiO2 films on stainless steel for use as a photocatalyst was investigated and compared to plasma-enhanced ALD (PE-ALD) using the same precursor. Th-ALD TiO2 films were deposited on stainless steel using a Ti(NMe2)4 [tetrakis(dimethylamido) Ti, TDMAT] precursor. The microstructure of the Th-ALD TiO2 films was greatly dependent on the growth temperature as an amorphous structure was obtained at 200°C and a polycrystalline structure was achieved at temperatures above 300°C. From the contact angle measurement of water, the crystalline TiO2 films exhibited super-hydrophilicity after UV irradiation. The anatase phase of both the Th- and PE-ALD TiO2 films grown on stainless steel showed higher photocatalytic abilities than the rutile phase grown at 400°C. In addition, the anatase PE-ALD TiO2 film demonstrated a higher photocatalytic efficiency than the Th-ALD films. The photocatalytic efficiency of the Th-ALD TiO2 films was investigated as a function of film thickness and it was found that the efficiency was saturated above a film thickness of 120nm.

AB - The thermal atomic layer deposition (Th-ALD) of TiO2 films on stainless steel for use as a photocatalyst was investigated and compared to plasma-enhanced ALD (PE-ALD) using the same precursor. Th-ALD TiO2 films were deposited on stainless steel using a Ti(NMe2)4 [tetrakis(dimethylamido) Ti, TDMAT] precursor. The microstructure of the Th-ALD TiO2 films was greatly dependent on the growth temperature as an amorphous structure was obtained at 200°C and a polycrystalline structure was achieved at temperatures above 300°C. From the contact angle measurement of water, the crystalline TiO2 films exhibited super-hydrophilicity after UV irradiation. The anatase phase of both the Th- and PE-ALD TiO2 films grown on stainless steel showed higher photocatalytic abilities than the rutile phase grown at 400°C. In addition, the anatase PE-ALD TiO2 film demonstrated a higher photocatalytic efficiency than the Th-ALD films. The photocatalytic efficiency of the Th-ALD TiO2 films was investigated as a function of film thickness and it was found that the efficiency was saturated above a film thickness of 120nm.

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