Photoalignment material of high thermal resistance with hydroxyl aromatic polyimide for liquid crystal display

Whee Won Lee; Jeoung Yeon Hwang; Myon Kil Choi; Dong Hack Suh; Dae Shik Seo

doi:10.1080/00150190600966839

Photoalignment material of high thermal resistance with hydroxyl aromatic polyimide for liquid crystal display

Whee Won Lee, Jeoung Yeon Hwang, Myon Kil Choi, Dong Hack Suh, Dae Shik Seo

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Conference article › peer-review

3 Citations (Scopus)

Abstract

We synthesized photoalignment material of high thermal resistance with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the photopolymer surface can be obtained. However, the low pretilt angles were obtained below 1°. The voltage-transmittance curve without backflow bounce in the photoaligned TN cell with UV exposure was observed. The response time of photoaligned TN cell was measured about 24 ms. The residual DC voltage of photoaligned TN cell will be discussed.

Original language	English
Pages (from-to)	51-61
Number of pages	11
Journal	Ferroelectrics
Volume	344
DOIs	https://doi.org/10.1080/00150190600966839
Publication status	Published - 2006
Event	2005 International Meeting on Ferroelectricity, IMF-11 - , Argentina Duration: 2005 Sept 5 → 2005 Sept 9

Bibliographical note

Funding Information:
This work was supported by National Research Laboratory program (M1-0203-00-0008).

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1080/00150190600966839

Cite this

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title = "Photoalignment material of high thermal resistance with hydroxyl aromatic polyimide for liquid crystal display",

abstract = "We synthesized photoalignment material of high thermal resistance with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the photopolymer surface can be obtained. However, the low pretilt angles were obtained below 1°. The voltage-transmittance curve without backflow bounce in the photoaligned TN cell with UV exposure was observed. The response time of photoaligned TN cell was measured about 24 ms. The residual DC voltage of photoaligned TN cell will be discussed.",

author = "Lee, {Whee Won} and Hwang, {Jeoung Yeon} and Choi, {Myon Kil} and Suh, {Dong Hack} and Seo, {Dae Shik}",

note = "Funding Information: This work was supported by National Research Laboratory program (M1-0203-00-0008).; 2005 International Meeting on Ferroelectricity, IMF-11 ; Conference date: 05-09-2005 Through 09-09-2005",

year = "2006",

doi = "10.1080/00150190600966839",

language = "English",

volume = "344",

pages = "51--61",

journal = "Ferroelectrics",

issn = "0015-0193",

publisher = "Taylor and Francis Ltd.",

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TY - JOUR

T1 - Photoalignment material of high thermal resistance with hydroxyl aromatic polyimide for liquid crystal display

AU - Lee, Whee Won

AU - Hwang, Jeoung Yeon

AU - Choi, Myon Kil

AU - Suh, Dong Hack

AU - Seo, Dae Shik

N1 - Funding Information: This work was supported by National Research Laboratory program (M1-0203-00-0008).

PY - 2006

Y1 - 2006

N2 - We synthesized photoalignment material of high thermal resistance with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the photopolymer surface can be obtained. However, the low pretilt angles were obtained below 1°. The voltage-transmittance curve without backflow bounce in the photoaligned TN cell with UV exposure was observed. The response time of photoaligned TN cell was measured about 24 ms. The residual DC voltage of photoaligned TN cell will be discussed.

AB - We synthesized photoalignment material of high thermal resistance with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the photopolymer surface can be obtained. However, the low pretilt angles were obtained below 1°. The voltage-transmittance curve without backflow bounce in the photoaligned TN cell with UV exposure was observed. The response time of photoaligned TN cell was measured about 24 ms. The residual DC voltage of photoaligned TN cell will be discussed.

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U2 - 10.1080/00150190600966839

DO - 10.1080/00150190600966839

M3 - Conference article

AN - SCOPUS:38849164129

SN - 0015-0193

VL - 344

SP - 51

EP - 61

JO - Ferroelectrics

JF - Ferroelectrics

T2 - 2005 International Meeting on Ferroelectricity, IMF-11

Y2 - 5 September 2005 through 9 September 2005

ER -

Photoalignment material of high thermal resistance with hydroxyl aromatic polyimide for liquid crystal display

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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