Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO2 thin films

Junjie Xiong; Sachindra Nath Das; Sungyeon Kim; Jinhyong Lim; Hyun Choi; Jae Min Myoung

doi:10.1016/j.surfcoat.2010.04.001

Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO₂ thin films

Junjie Xiong, Sachindra Nath Das, Sungyeon Kim, Jinhyong Lim, Hyun Choi, Jae Min Myoung

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

40 Citations (Scopus)

Abstract

TiO₂ thin films were deposited by reactive radio frequency magnetron sputtering of Ti target at low working pressure (1mTorr) and various O₂ and Ar flow ratios (R_O2=O₂/(O₂+Ar)). Properties of TiO₂ films were measured by field emission scanning electron microscopy, atomic force microscopy, X-ray diffractometry, UV-VIS transmission spectroscopy, X-ray photoelectron spectroscopy and evaluated by contact angle analysis. Well defined columnar structure with rough surface was obtained at relatively lower R_O2. As R_O2 increased, the oxygen vacancies in the films decreased and the stoichiometric ratio of O/Ti changed from 1.79 to 1.98. Transition from anatase to rutile phase was observed with increase in R_O2. The optical bandgap showed a red shift with increase in R_O2. In addition, the film with co-existing of rutile and anatase showed a high Urbach tail. Lower R_O2 resulted in higher photo-hydrophilicizing efficiency due to the change in morphology, structure and composition. However, very low R_O2 (less than 10%), which led to transition mode, resulted in poor photo-hydrophilicizing efficiency.

Original language	English
Pages (from-to)	3436-3442
Number of pages	7
Journal	Surface and Coatings Technology
Volume	204
Issue number	21-22
DOIs	https://doi.org/10.1016/j.surfcoat.2010.04.001
Publication status	Published - 2010 Aug

All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/j.surfcoat.2010.04.001

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title = "Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO2 thin films",

abstract = "TiO2 thin films were deposited by reactive radio frequency magnetron sputtering of Ti target at low working pressure (1mTorr) and various O2 and Ar flow ratios (RO2=O2/(O2+Ar)). Properties of TiO2 films were measured by field emission scanning electron microscopy, atomic force microscopy, X-ray diffractometry, UV-VIS transmission spectroscopy, X-ray photoelectron spectroscopy and evaluated by contact angle analysis. Well defined columnar structure with rough surface was obtained at relatively lower RO2. As RO2 increased, the oxygen vacancies in the films decreased and the stoichiometric ratio of O/Ti changed from 1.79 to 1.98. Transition from anatase to rutile phase was observed with increase in RO2. The optical bandgap showed a red shift with increase in RO2. In addition, the film with co-existing of rutile and anatase showed a high Urbach tail. Lower RO2 resulted in higher photo-hydrophilicizing efficiency due to the change in morphology, structure and composition. However, very low RO2 (less than 10%), which led to transition mode, resulted in poor photo-hydrophilicizing efficiency.",

author = "Junjie Xiong and Das, {Sachindra Nath} and Sungyeon Kim and Jinhyong Lim and Hyun Choi and Myoung, {Jae Min}",

year = "2010",

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doi = "10.1016/j.surfcoat.2010.04.001",

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T1 - Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO2 thin films

AU - Xiong, Junjie

AU - Das, Sachindra Nath

AU - Kim, Sungyeon

AU - Lim, Jinhyong

AU - Choi, Hyun

AU - Myoung, Jae Min

PY - 2010/8

Y1 - 2010/8

N2 - TiO2 thin films were deposited by reactive radio frequency magnetron sputtering of Ti target at low working pressure (1mTorr) and various O2 and Ar flow ratios (RO2=O2/(O2+Ar)). Properties of TiO2 films were measured by field emission scanning electron microscopy, atomic force microscopy, X-ray diffractometry, UV-VIS transmission spectroscopy, X-ray photoelectron spectroscopy and evaluated by contact angle analysis. Well defined columnar structure with rough surface was obtained at relatively lower RO2. As RO2 increased, the oxygen vacancies in the films decreased and the stoichiometric ratio of O/Ti changed from 1.79 to 1.98. Transition from anatase to rutile phase was observed with increase in RO2. The optical bandgap showed a red shift with increase in RO2. In addition, the film with co-existing of rutile and anatase showed a high Urbach tail. Lower RO2 resulted in higher photo-hydrophilicizing efficiency due to the change in morphology, structure and composition. However, very low RO2 (less than 10%), which led to transition mode, resulted in poor photo-hydrophilicizing efficiency.

AB - TiO2 thin films were deposited by reactive radio frequency magnetron sputtering of Ti target at low working pressure (1mTorr) and various O2 and Ar flow ratios (RO2=O2/(O2+Ar)). Properties of TiO2 films were measured by field emission scanning electron microscopy, atomic force microscopy, X-ray diffractometry, UV-VIS transmission spectroscopy, X-ray photoelectron spectroscopy and evaluated by contact angle analysis. Well defined columnar structure with rough surface was obtained at relatively lower RO2. As RO2 increased, the oxygen vacancies in the films decreased and the stoichiometric ratio of O/Ti changed from 1.79 to 1.98. Transition from anatase to rutile phase was observed with increase in RO2. The optical bandgap showed a red shift with increase in RO2. In addition, the film with co-existing of rutile and anatase showed a high Urbach tail. Lower RO2 resulted in higher photo-hydrophilicizing efficiency due to the change in morphology, structure and composition. However, very low RO2 (less than 10%), which led to transition mode, resulted in poor photo-hydrophilicizing efficiency.

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Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO₂ thin films

Abstract

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