Abstract
In this paper we report the performance comparison of 5GHz CMOS VCOs fabricated by 0.18μm six-metal mixed-mode RF CMOS processes with respect to the same VCOs integrated with high Q MEMS inductors. The CMOS inductors implemented by a top-level 2μm-thick AI/Cu metal layer typically show Q factors of about 10, while the MEMS inductors can give much higher Q factors over 25. Differential CMOS VCO circuits have been optimally designed for the respective Q factors of both CMOS and MEMS inductors. Phase noise has been measured and compared for the fabricated VCOs, demonstrating that the VCOs with MEMS inductors can give better phase noise by more than 7dB in the offset frequency range from 30kHz to 3MHz.
Original language | English |
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Pages (from-to) | 721-724 |
Number of pages | 4 |
Journal | IEEE MTT-S International Microwave Symposium Digest |
Volume | 2 |
Publication status | Published - 2003 |
Event | 2003 IEEE MTT-S International Microwave Symposium Digest - Philadelphia, PA, United States Duration: 2003 Jun 8 → 2003 Jun 13 |
All Science Journal Classification (ASJC) codes
- Radiation
- Condensed Matter Physics
- Electrical and Electronic Engineering