Abstract
We report on the fabrication of low-voltage pentacene thin-film transistors (TFTs) adopting poly-4-vinylphenol (PVP)/titanium oxide (TiOx) double-layer dielectrics deposited on an indium-tin oxide glass substrate. The total capacitance of the 45 nm thick PVP100 nm thick (or 200 nm thick) TiOx double-layer dielectric was as high as 57-61 nF cm2 while the k values turn out to be 25-34. Despite small dielectric strength (∼0.6 MVcm) of high- k TiOx layers, our pentacene TFT with the 45 nm thick PVP100 nm thick TiOx double-layer dielectric exhibited an excellent mobility and an on/off current ratio of 1.52 cm2 V s and ∼1× 103, respectively, operating at a low gate voltage of -3 V.
Original language | English |
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Pages (from-to) | H114-H116 |
Journal | Electrochemical and Solid-State Letters |
Volume | 10 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2007 |
All Science Journal Classification (ASJC) codes
- Chemical Engineering(all)
- Materials Science(all)
- Physical and Theoretical Chemistry
- Electrochemistry
- Electrical and Electronic Engineering