TY - JOUR
T1 - Patterned pyroelectric electron emitters and their feasibility study for lithography applications
AU - Moon, Chang Wook
AU - Kim, Dong Wook
AU - Rosenman, G.
AU - Ko, Tae Kuk
AU - Yoo, In K.
PY - 2003/6
Y1 - 2003/6
N2 - Patterned electron emitters were fabricated using LiNbO3 (LN) single crystals and their characteristics were investigated for electron-beam lithography applications. Pyroelectrically induced electron emission was suppressed by coating Pt and Ti thin films. However, the electron emission behaviors were not affected by the deposition of SiO2 dielectric layers. Based on these observations, a structure of patterned emitters was suggested; Ti layers and SiO2 layers were used as blocking layers and emission layers, respectively. By using a 1:1 electron beam projection system, 100 μm and 5 μm dots on the exposed resist were obtained from 300 μm and 30 μm dots on emitters. Reduction of patterns might be useful in obtaining fine patterns without complex electron optics.
AB - Patterned electron emitters were fabricated using LiNbO3 (LN) single crystals and their characteristics were investigated for electron-beam lithography applications. Pyroelectrically induced electron emission was suppressed by coating Pt and Ti thin films. However, the electron emission behaviors were not affected by the deposition of SiO2 dielectric layers. Based on these observations, a structure of patterned emitters was suggested; Ti layers and SiO2 layers were used as blocking layers and emission layers, respectively. By using a 1:1 electron beam projection system, 100 μm and 5 μm dots on the exposed resist were obtained from 300 μm and 30 μm dots on emitters. Reduction of patterns might be useful in obtaining fine patterns without complex electron optics.
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U2 - 10.1143/jjap.42.3523
DO - 10.1143/jjap.42.3523
M3 - Article
AN - SCOPUS:0041379711
SN - 0021-4922
VL - 42
SP - 3523
EP - 3525
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 6 A
ER -