Oxide semiconductor TFTs for the next generation LCD-TV applications

Je Hun Lee, Do Hyun Kim, Dong Ju Yang, Sun Young Hong, Kap Soo Yoon, Pil Soon Hong, Chang Oh Jeong, Geun Lee Woo, Jin Ho Song, Yul Kim Shi, Soo Kim Sang, Kyoung Seok Son, Tae Sang Kim, Jang Yeon Kwon, Sang Yoon Lee

Research output: Contribution to journalConference articlepeer-review


For a large sized, ultra definition (UD) and high refresh rate for motion blur free AMLCD TVs, amorphous IGZO thin film transistor (TFT) are applied and investigated in terms of threshold voltage (Vth) shift influenced by active layer thickness uniformity, source drain etching technology, heat treatment and passivation condition. Optimizing above parameters, we fabricated the world's largest 15 inch XGA AMLCD successfully.

Original languageEnglish
Pages (from-to)1203-1207
Number of pages5
JournalProceedings of International Meeting on Information Display
Publication statusPublished - 2008
Event8th International Meeting on Information Display - International Display Manufacturing Conference 2008 and Asia Display 2008, IMID/IDMC/ASIA DISPLAY 2008 - Ilsan, Korea, Republic of
Duration: 2008 Oct 132008 Oct 17

All Science Journal Classification (ASJC) codes

  • General Engineering


Dive into the research topics of 'Oxide semiconductor TFTs for the next generation LCD-TV applications'. Together they form a unique fingerprint.

Cite this