Oxidation behavior of U3Si (3.9 wt% Si) in air at 250-400°C

Kweon Ho Kang, Keon Sik Kim, Kil Jeong Kim, Yong Chil Seo, Young Moo Park

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


The oxidation of U3Si was studied using a thermogravimetric analyzer and an XRD in the temperature range from 250 to 400°C in air. From XRD studies it was found that U3Si converted to UO2, U2O5 and Si after 200 h at temperatures up to 275°C and it converted to UO2, U3O7, SiO and SiO2 after 200 h at the temperature of 300°C. U3O8 began to be formed at the temperature of 325°C. The linear reaction rate was observed at lower temperatures up to 275°C in the experimental range of reaction time. For higher temperatures, however, the reaction rate was nearly linear at initial stage of reaction and more sharply increased after a certain time due to cracking, breaking and pulverizing in the specimen. The reaction was controlled by diffusion rather than chemical reaction kinetics. The averaged rate assuming a linear rate equation could be expressed with activation energies that were 122.29 kJ/mol and 69.65 kJ/mol the temperature ranges of 250 ≤ T(°C) ≤ 300 and 300 ≤ T(°C) ≤ 400 respectively.

Original languageEnglish
Pages (from-to)220-226
Number of pages7
JournalJournal of Nuclear Materials
Issue number2
Publication statusPublished - 1996 Mar

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering


Dive into the research topics of 'Oxidation behavior of U3Si (3.9 wt% Si) in air at 250-400°C'. Together they form a unique fingerprint.

Cite this