One-step micropatterning of highly-ordered semi-crystalline poly(vinylidene fluoride-co-trifluoroethylene) films by a selective shear and detachment process

Jiyoun Chang; Hee Joon Jung; Huisu Jeong; Youn Jung Park; Jinwoo Sung; Seok Ju Kang; Gun Young Jung; Myung M. Sung; Cheolmin Park

doi:10.1016/j.orgel.2010.10.007

One-step micropatterning of highly-ordered semi-crystalline poly(vinylidene fluoride-co-trifluoroethylene) films by a selective shear and detachment process

Jiyoun Chang, Hee Joon Jung, Huisu Jeong, Youn Jung Park, Jinwoo Sung, Seok Ju Kang, Gun Young Jung, Myung M. Sung, Cheolmin Park

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

We present a one-step route for micropatterning a thin ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) film with both molecular and microstructural crystal control over a large area. The method is based on the static mechanical shearing and subsequent detachment of a film spin coated on pre-patterned Al which has been lithographically prepared on a SiO₂ substrate under appropriate thermal conditions. Selective detachment of the film in contact with the SiO₂ substrate gave rise to micropatterns of PVDF-TrFE film positioned only on the Al regions. Further, the PVDF-TrFE film showed 25-nm-thick crystalline lamellae aligned perpendicular to the shear direction, wherein the c axis of the crystals was globally ordered parallel to the shear direction. The sheared and patterned PVDF-TrFE thin films are readily incorporated into non-volatile memory units of metal/ferroelectric/ metal capacitors and bottom gate-top contact field effect transistors, leading to arrays of memory devices with enhanced performance.

Original language	English
Pages (from-to)	98-107
Number of pages	10
Journal	Organic Electronics
Volume	12
Issue number	1
DOIs	https://doi.org/10.1016/j.orgel.2010.10.007
Publication status	Published - 2011 Jan

Bibliographical note

Funding Information:
This project was supported by The National Research Program for Memory Development sponsored by the Ministry of Knowledge and Economy, Republic of Korea . This work was partly supported by the IT R&D Program of MKE/KEIT [10030559, Development of next generation high performance organic/nano materials and printing process technology] and the Seoul R&BD Program (10816). The X-ray experiments at PAL (4C2 beamline), Korea, were supported by MEST and POSCO, Korea. This work was supported by the Second Stage of the Brain Korea 21 Project in 2006, the Converging Research Center Program funded by the Ministry of Education, Science and Technology ( 2010K001149 ), and the National Research Foundation of Korea (NRF) grant funded by the Korea government (MEST) (No. 2010-0000425 ).

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Biomaterials
Chemistry(all)
Condensed Matter Physics
Materials Chemistry
Electrical and Electronic Engineering

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10.1016/j.orgel.2010.10.007

Cite this

@article{cc3a29b85dc249c899b3ba3e6c2fccad,

title = "One-step micropatterning of highly-ordered semi-crystalline poly(vinylidene fluoride-co-trifluoroethylene) films by a selective shear and detachment process",

abstract = "We present a one-step route for micropatterning a thin ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) film with both molecular and microstructural crystal control over a large area. The method is based on the static mechanical shearing and subsequent detachment of a film spin coated on pre-patterned Al which has been lithographically prepared on a SiO2 substrate under appropriate thermal conditions. Selective detachment of the film in contact with the SiO2 substrate gave rise to micropatterns of PVDF-TrFE film positioned only on the Al regions. Further, the PVDF-TrFE film showed 25-nm-thick crystalline lamellae aligned perpendicular to the shear direction, wherein the c axis of the crystals was globally ordered parallel to the shear direction. The sheared and patterned PVDF-TrFE thin films are readily incorporated into non-volatile memory units of metal/ferroelectric/ metal capacitors and bottom gate-top contact field effect transistors, leading to arrays of memory devices with enhanced performance.",

author = "Jiyoun Chang and Jung, {Hee Joon} and Huisu Jeong and Park, {Youn Jung} and Jinwoo Sung and Kang, {Seok Ju} and Jung, {Gun Young} and Sung, {Myung M.} and Cheolmin Park",

note = "Funding Information: This project was supported by The National Research Program for Memory Development sponsored by the Ministry of Knowledge and Economy, Republic of Korea . This work was partly supported by the IT R&D Program of MKE/KEIT [10030559, Development of next generation high performance organic/nano materials and printing process technology] and the Seoul R&BD Program (10816). The X-ray experiments at PAL (4C2 beamline), Korea, were supported by MEST and POSCO, Korea. This work was supported by the Second Stage of the Brain Korea 21 Project in 2006, the Converging Research Center Program funded by the Ministry of Education, Science and Technology ( 2010K001149 ), and the National Research Foundation of Korea (NRF) grant funded by the Korea government (MEST) (No. 2010-0000425 ). ",

year = "2011",

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doi = "10.1016/j.orgel.2010.10.007",

language = "English",

volume = "12",

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journal = "Organic Electronics",

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T1 - One-step micropatterning of highly-ordered semi-crystalline poly(vinylidene fluoride-co-trifluoroethylene) films by a selective shear and detachment process

AU - Chang, Jiyoun

AU - Jung, Hee Joon

AU - Jeong, Huisu

AU - Park, Youn Jung

AU - Sung, Jinwoo

AU - Kang, Seok Ju

AU - Jung, Gun Young

AU - Sung, Myung M.

AU - Park, Cheolmin

N1 - Funding Information: This project was supported by The National Research Program for Memory Development sponsored by the Ministry of Knowledge and Economy, Republic of Korea . This work was partly supported by the IT R&D Program of MKE/KEIT [10030559, Development of next generation high performance organic/nano materials and printing process technology] and the Seoul R&BD Program (10816). The X-ray experiments at PAL (4C2 beamline), Korea, were supported by MEST and POSCO, Korea. This work was supported by the Second Stage of the Brain Korea 21 Project in 2006, the Converging Research Center Program funded by the Ministry of Education, Science and Technology ( 2010K001149 ), and the National Research Foundation of Korea (NRF) grant funded by the Korea government (MEST) (No. 2010-0000425 ).

PY - 2011/1

Y1 - 2011/1

N2 - We present a one-step route for micropatterning a thin ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) film with both molecular and microstructural crystal control over a large area. The method is based on the static mechanical shearing and subsequent detachment of a film spin coated on pre-patterned Al which has been lithographically prepared on a SiO2 substrate under appropriate thermal conditions. Selective detachment of the film in contact with the SiO2 substrate gave rise to micropatterns of PVDF-TrFE film positioned only on the Al regions. Further, the PVDF-TrFE film showed 25-nm-thick crystalline lamellae aligned perpendicular to the shear direction, wherein the c axis of the crystals was globally ordered parallel to the shear direction. The sheared and patterned PVDF-TrFE thin films are readily incorporated into non-volatile memory units of metal/ferroelectric/ metal capacitors and bottom gate-top contact field effect transistors, leading to arrays of memory devices with enhanced performance.

AB - We present a one-step route for micropatterning a thin ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) film with both molecular and microstructural crystal control over a large area. The method is based on the static mechanical shearing and subsequent detachment of a film spin coated on pre-patterned Al which has been lithographically prepared on a SiO2 substrate under appropriate thermal conditions. Selective detachment of the film in contact with the SiO2 substrate gave rise to micropatterns of PVDF-TrFE film positioned only on the Al regions. Further, the PVDF-TrFE film showed 25-nm-thick crystalline lamellae aligned perpendicular to the shear direction, wherein the c axis of the crystals was globally ordered parallel to the shear direction. The sheared and patterned PVDF-TrFE thin films are readily incorporated into non-volatile memory units of metal/ferroelectric/ metal capacitors and bottom gate-top contact field effect transistors, leading to arrays of memory devices with enhanced performance.

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One-step micropatterning of highly-ordered semi-crystalline poly(vinylidene fluoride-co-trifluoroethylene) films by a selective shear and detachment process

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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