New top-down approach for fabricating high-aspect-ratio complex nanostructures with 10 nm scale features

Hwan Jin Jeon; Kyoung Hwan Kim; Youn Kyoung Baek; Dae Woo Kim; Hee Tae Jung

doi:10.1021/nl1025776

New top-down approach for fabricating high-aspect-ratio complex nanostructures with 10 nm scale features

Hwan Jin Jeon, Kyoung Hwan Kim, Youn Kyoung Baek, Dae Woo Kim, Hee Tae Jung

Department of Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

63 Citations (Scopus)

Abstract

We describe a new patterning technique, named "secondary sputtering lithography" that enables fabrication of ultrahigh-resolution (ca. 10 nm) and high aspect ratio (ca. 15) patterns of three-dimensional various shapes. In this methodology, target materials are etched and deposited onto the side surface of a prepatterned polymer by using low Ar ion bombarding energies, based on the angular distribution of target particles by ion-beam bombardment. After removal of the prepatterned polymer, high aspect ratios and high-resolution patterns of target materials are created.

Original language	English
Pages (from-to)	3604-3610
Number of pages	7
Journal	Nano letters
Volume	10
Issue number	9
DOIs	https://doi.org/10.1021/nl1025776
Publication status	Published - 2010 Sept 8

All Science Journal Classification (ASJC) codes

Bioengineering
Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanical Engineering

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10.1021/nl1025776

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AU - Baek, Youn Kyoung

AU - Kim, Dae Woo

AU - Jung, Hee Tae

PY - 2010/9/8

Y1 - 2010/9/8

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AB - We describe a new patterning technique, named "secondary sputtering lithography" that enables fabrication of ultrahigh-resolution (ca. 10 nm) and high aspect ratio (ca. 15) patterns of three-dimensional various shapes. In this methodology, target materials are etched and deposited onto the side surface of a prepatterned polymer by using low Ar ion bombarding energies, based on the angular distribution of target particles by ion-beam bombardment. After removal of the prepatterned polymer, high aspect ratios and high-resolution patterns of target materials are created.

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New top-down approach for fabricating high-aspect-ratio complex nanostructures with 10 nm scale features

Abstract

All Science Journal Classification (ASJC) codes

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