TY - JOUR
T1 - Nearly massless electrons in the silicon interface with a metal film
AU - Kim, Keun Su
AU - Jung, Sung Chul
AU - Kang, Myung Ho
AU - Yeom, Han Woong
PY - 2010/6/16
Y1 - 2010/6/16
N2 - We demonstrate the realization of nearly massless electrons in the most widely used device material, silicon, at the interface with a metal film. Using angle-resolved photoemission, we found that the surface band of a monolayer lead film drives a hole band of the Si inversion layer formed at the interface with the film to have a nearly linear dispersion with an effective mass about 20 times lighter than bulk Si and comparable to graphene. The reduction of mass can be accounted for by a repulsive interaction between neighboring bands of the metal film and Si substrate. Our result suggests a promising way to take advantage of massless carriers in silicon-based thin-film devices, which can also be applied to various other semiconductor devices.
AB - We demonstrate the realization of nearly massless electrons in the most widely used device material, silicon, at the interface with a metal film. Using angle-resolved photoemission, we found that the surface band of a monolayer lead film drives a hole band of the Si inversion layer formed at the interface with the film to have a nearly linear dispersion with an effective mass about 20 times lighter than bulk Si and comparable to graphene. The reduction of mass can be accounted for by a repulsive interaction between neighboring bands of the metal film and Si substrate. Our result suggests a promising way to take advantage of massless carriers in silicon-based thin-film devices, which can also be applied to various other semiconductor devices.
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U2 - 10.1103/PhysRevLett.104.246803
DO - 10.1103/PhysRevLett.104.246803
M3 - Article
AN - SCOPUS:77953692910
SN - 0031-9007
VL - 104
JO - Physical Review Letters
JF - Physical Review Letters
IS - 24
M1 - 246803
ER -