Nanoscale 2.5-dimensional surface patterning with plasmonic lithography

Howon Jung, Changhoon Park, Seonghyeon Oh, Jae W. Hahn

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


We report an extension of plasmonic lithography to nanoscale 2.5-dimensional (2.5D) surface patterning. To obtain the impulse response of a plasmonic lithography system, we described the field distribution of a point dipole source generated by a metallic ridge aperture with a theoretical model using the concepts of quasi-spherical waves and surface plasmon-polaritons. We performed deconvolution to construct an exposure map of a target shape for patterning. For practical applications, we fabricated several nanoscale and microscale structures, such as a cone, microlens array, nanoneedle, and a multiscale structure using the plasmonic lithography system. We verified the possibility of applying plasmonic lithography to multiscale structuring from a few tens of nanometres to a few micrometres in the lateral dimension. We obtained a root-mean-square error of 4.7 nm between the target shape and the patterned shape, and a surface roughness of 11.5 nm.

Original languageEnglish
Article number9721
JournalScientific reports
Issue number1
Publication statusPublished - 2017 Dec 1

Bibliographical note

Funding Information:
This work was supported by a National Research Foundation of Korea (NRF) grant funded by the Korean government (MSIP) (NRF-2015R1A2A1A03064460).

Publisher Copyright:
© 2017 The Author(s).

All Science Journal Classification (ASJC) codes

  • General


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