Nanometer-accurate grating fabrication with scanning beam interference lithography

Carl G. Chen; Paul T. Konkola; Ralf K. Heilmann; Chulmin Joo; Mark L. Schattenburg

doi:10.1117/12.469431

Nanometer-accurate grating fabrication with scanning beam interference lithography

Carl G. Chen, Paul T. Konkola, Ralf K. Heilmann, Chulmin Joo, Mark L. Schattenburg

Department of Mechanical Engineering

Research output: Contribution to journal › Conference article › peer-review

33 Citations (Scopus)

Abstract

We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while the period of the fringes has to be stabilized to approximately one part per million. In this paper, we present a review of the SBIL design, and report recent progress towards prototyping the first-ever SBIL tool.

Original language	English
Pages (from-to)	126-134
Number of pages	9
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4936
DOIs	https://doi.org/10.1117/12.469431
Publication status	Published - 2002
Event	Nano- and Microtechnology: Materials, Processes, Packaging, and Systems - Melbourne, VIC., Australia Duration: 2002 Dec 16 → 2002 Dec 18

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.469431

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title = "Nanometer-accurate grating fabrication with scanning beam interference lithography",

abstract = "We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while the period of the fringes has to be stabilized to approximately one part per million. In this paper, we present a review of the SBIL design, and report recent progress towards prototyping the first-ever SBIL tool.",

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T1 - Nanometer-accurate grating fabrication with scanning beam interference lithography

AU - Chen, Carl G.

AU - Konkola, Paul T.

AU - Heilmann, Ralf K.

AU - Joo, Chulmin

AU - Schattenburg, Mark L.

PY - 2002

Y1 - 2002

N2 - We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while the period of the fringes has to be stabilized to approximately one part per million. In this paper, we present a review of the SBIL design, and report recent progress towards prototyping the first-ever SBIL tool.

AB - We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while the period of the fringes has to be stabilized to approximately one part per million. In this paper, we present a review of the SBIL design, and report recent progress towards prototyping the first-ever SBIL tool.

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VL - 4936

SP - 126

EP - 134

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Nano- and Microtechnology: Materials, Processes, Packaging, and Systems

Y2 - 16 December 2002 through 18 December 2002

ER -

Nanometer-accurate grating fabrication with scanning beam interference lithography

Abstract

All Science Journal Classification (ASJC) codes

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