Multiple internal reflection Fourier transform-infrared spectroscopy study on Si surface for measurement of PSL particles

Jahyun Yang; Kyungtaek Im; Juneyoung Lee; Sangwoo Lim

doi:10.1016/j.jiec.2009.09.060

Multiple internal reflection Fourier transform-infrared spectroscopy study on Si surface for measurement of PSL particles

Jahyun Yang, Kyungtaek Im, Juneyoung Lee, Sangwoo Lim

Department of Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Measurement of particles is crucial in wafer and photomask cleaning. In order to develop a simple method to quantify the number of particles on a semiconductor wafer, multiple internal reflection Fourier transform-infrared spectroscopy (MIR FT-IR) was used. The results using this measurement technique revealed that the number of polystyrene latex (PSL) particles deposited on a Si surface linearly increase with the concentration of PSL particles in deionized water. Furthermore, the ozonated deionized water (DIO₃) process was superior to the sulfuric peroxide mixture (SPM) process in suppressing the deposition of PSL particles. Using this measurement technique in combination with scanning electron microscopy (SEM) measurements, the number of PSL spheres in a unit area could be estimated from the peak absorbance intensity of C-H₂.

Original language	English
Pages (from-to)	763-766
Number of pages	4
Journal	Journal of Industrial and Engineering Chemistry
Volume	15
Issue number	5
DOIs	https://doi.org/10.1016/j.jiec.2009.09.060
Publication status	Published - 2009 Sept 25

Bibliographical note

Funding Information:
This work was financially supported by Hynix Semiconductor Inc.

All Science Journal Classification (ASJC) codes

Chemical Engineering(all)

Access to Document

10.1016/j.jiec.2009.09.060

Cite this

@article{3853491cc82b4e81a945c269dc9579cc,

title = "Multiple internal reflection Fourier transform-infrared spectroscopy study on Si surface for measurement of PSL particles",

abstract = "Measurement of particles is crucial in wafer and photomask cleaning. In order to develop a simple method to quantify the number of particles on a semiconductor wafer, multiple internal reflection Fourier transform-infrared spectroscopy (MIR FT-IR) was used. The results using this measurement technique revealed that the number of polystyrene latex (PSL) particles deposited on a Si surface linearly increase with the concentration of PSL particles in deionized water. Furthermore, the ozonated deionized water (DIO3) process was superior to the sulfuric peroxide mixture (SPM) process in suppressing the deposition of PSL particles. Using this measurement technique in combination with scanning electron microscopy (SEM) measurements, the number of PSL spheres in a unit area could be estimated from the peak absorbance intensity of C-H2.",

author = "Jahyun Yang and Kyungtaek Im and Juneyoung Lee and Sangwoo Lim",

note = "Funding Information: This work was financially supported by Hynix Semiconductor Inc.",

year = "2009",

month = sep,

day = "25",

doi = "10.1016/j.jiec.2009.09.060",

language = "English",

volume = "15",

pages = "763--766",

journal = "Journal of Industrial and Engineering Chemistry",

issn = "1226-086X",

publisher = "Korean Society of Industrial Engineering Chemistry",

number = "5",

}

TY - JOUR

T1 - Multiple internal reflection Fourier transform-infrared spectroscopy study on Si surface for measurement of PSL particles

AU - Yang, Jahyun

AU - Im, Kyungtaek

AU - Lee, Juneyoung

AU - Lim, Sangwoo

N1 - Funding Information: This work was financially supported by Hynix Semiconductor Inc.

PY - 2009/9/25

Y1 - 2009/9/25

N2 - Measurement of particles is crucial in wafer and photomask cleaning. In order to develop a simple method to quantify the number of particles on a semiconductor wafer, multiple internal reflection Fourier transform-infrared spectroscopy (MIR FT-IR) was used. The results using this measurement technique revealed that the number of polystyrene latex (PSL) particles deposited on a Si surface linearly increase with the concentration of PSL particles in deionized water. Furthermore, the ozonated deionized water (DIO3) process was superior to the sulfuric peroxide mixture (SPM) process in suppressing the deposition of PSL particles. Using this measurement technique in combination with scanning electron microscopy (SEM) measurements, the number of PSL spheres in a unit area could be estimated from the peak absorbance intensity of C-H2.

AB - Measurement of particles is crucial in wafer and photomask cleaning. In order to develop a simple method to quantify the number of particles on a semiconductor wafer, multiple internal reflection Fourier transform-infrared spectroscopy (MIR FT-IR) was used. The results using this measurement technique revealed that the number of polystyrene latex (PSL) particles deposited on a Si surface linearly increase with the concentration of PSL particles in deionized water. Furthermore, the ozonated deionized water (DIO3) process was superior to the sulfuric peroxide mixture (SPM) process in suppressing the deposition of PSL particles. Using this measurement technique in combination with scanning electron microscopy (SEM) measurements, the number of PSL spheres in a unit area could be estimated from the peak absorbance intensity of C-H2.

UR - http://www.scopus.com/inward/record.url?scp=70449533122&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=70449533122&partnerID=8YFLogxK

U2 - 10.1016/j.jiec.2009.09.060

DO - 10.1016/j.jiec.2009.09.060

M3 - Article

AN - SCOPUS:70449533122

SN - 1226-086X

VL - 15

SP - 763

EP - 766

JO - Journal of Industrial and Engineering Chemistry

JF - Journal of Industrial and Engineering Chemistry

IS - 5

ER -

Multiple internal reflection Fourier transform-infrared spectroscopy study on Si surface for measurement of PSL particles

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this