MoS2 doping by atomic layer deposition of high-k dielectrics using alcohol as process oxidants

Whang Je Woo, Seunggi Seo, Taewook Nam, Youngjun Kim, Donghyun Kim, Jeong Gyu Song, Il Kwon Oh, Jun Hyung Lim, Hyung Jun Kim, Hyungjun Kim

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

We developed doping technique of transition metal dichalcogenides based on atomic layer deposition (ALD) of oxide thin films. In this study, we deposited ALD Al2O3 overlayer using various oxidant including iso-propyl alcohol (IPA) and ethanol and investigated the doping effects depending on the choice of oxidant for ALD process. The doping effects were investigated by the change in the performance of bottom-gated MoS2 field effect transistors. Experimental results indicate that Al2O3 overlayer deposited using IPA as ALD reactant produces more efficient n-type doping effect compared to ethanol. Moreover, doping was effectively controlled by modulating atomic layer deposition process. ALD process using effective oxidant material is expected to be practically used for realizing the fabrication of threshold voltage-controllable transistors or further applications such as diodes.

Original languageEnglish
Article number148504
JournalApplied Surface Science
Volume541
DOIs
Publication statusPublished - 2021 Mar 1

Bibliographical note

Funding Information:
This work was supported by Samsung Display CO. LTD; and the Materials and Components Technology Development Program of MOTIE/KEIT [10080527, Development of commercialization technology of high sensitive gas sensor based on chalcogenide 2D nano material].

Funding Information:
This work was supported by Samsung Display CO., LTD; and the Materials and Components Technology Development Program of MOTIE/KEIT [10080527, Development of commercialization technology of high sensitive gas sensor based on chalcogenide 2D nano material].

Publisher Copyright:
© 2020

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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