Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components

Kwang Seok Yun; Euisik Yoon

Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components

Kwang Seok Yun, Euisik Yoon

Yonsei Advanced Science Institute

Research output: Contribution to journal › Conference article › peer-review

7 Citations (Scopus)

Abstract

This paper reports a new technology for the formation of various 3-dimensional positive photoresist structures with simple photolithography by using UV-insensitive sacrificial photoresist and its selective development in specific developer solution with combination of multi-exposure and single development technique. We have successfully implemented various 3-dimensional photoresist structures including recessed cantilevers, suspended bridges and complex plates with micro-pits or micro-villi, which are utilized as micro master molds for PDMS microfluidic components.

Original language	English
Pages (from-to)	757-760
Number of pages	4
Journal	Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Publication status	Published - 2004
Event	17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest - Maastricht, Netherlands Duration: 2004 Jan 25 → 2004 Jan 29

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Mechanical Engineering
Electrical and Electronic Engineering

Cite this

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title = "Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components",

abstract = "This paper reports a new technology for the formation of various 3-dimensional positive photoresist structures with simple photolithography by using UV-insensitive sacrificial photoresist and its selective development in specific developer solution with combination of multi-exposure and single development technique. We have successfully implemented various 3-dimensional photoresist structures including recessed cantilevers, suspended bridges and complex plates with micro-pits or micro-villi, which are utilized as micro master molds for PDMS microfluidic components.",

author = "Yun, {Kwang Seok} and Euisik Yoon",

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language = "English",

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journal = "Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)",

issn = "1084-6999",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest ; Conference date: 25-01-2004 Through 29-01-2004",

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Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components. / Yun, Kwang Seok; Yoon, Euisik.
In: Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), 2004, p. 757-760.

Research output: Contribution to journal › Conference article › peer-review

TY - JOUR

T1 - Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components

AU - Yun, Kwang Seok

AU - Yoon, Euisik

PY - 2004

Y1 - 2004

N2 - This paper reports a new technology for the formation of various 3-dimensional positive photoresist structures with simple photolithography by using UV-insensitive sacrificial photoresist and its selective development in specific developer solution with combination of multi-exposure and single development technique. We have successfully implemented various 3-dimensional photoresist structures including recessed cantilevers, suspended bridges and complex plates with micro-pits or micro-villi, which are utilized as micro master molds for PDMS microfluidic components.

AB - This paper reports a new technology for the formation of various 3-dimensional positive photoresist structures with simple photolithography by using UV-insensitive sacrificial photoresist and its selective development in specific developer solution with combination of multi-exposure and single development technique. We have successfully implemented various 3-dimensional photoresist structures including recessed cantilevers, suspended bridges and complex plates with micro-pits or micro-villi, which are utilized as micro master molds for PDMS microfluidic components.

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M3 - Conference article

AN - SCOPUS:3042739420

SN - 1084-6999

SP - 757

EP - 760

JO - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

JF - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

T2 - 17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest

Y2 - 25 January 2004 through 29 January 2004

ER -

Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components

Abstract

All Science Journal Classification (ASJC) codes

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